Dr. Masahiro Oya Profile

Dr. Masahiro Oya

at TASMIT Inc

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 19 October 2023

Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

Chih-I Wei, Seulki Kang, Sayantan Das, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Germain Fenger, Azat Latypov, Ir Kusnadi, Gurdaman Khaira, Yuichiro Yamazaki, Werner Gillijns, Sandip Halder, Gian Lorusso

JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603

KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

High-performance denoiser based on deep learning trained by precisely reproduced SEM noise

Taihei Mori, Yosuke Okamoto, Masahiro Oya, Shinji Mizutani, Shinichi Nakazawa, Kotaro Maruyama, Yuichiro Yamazaki

Proceedings Volume 12053, 120531D (2022) https://doi.org/10.1117/12.2615750

KEYWORDS: Scanning electron microscopy, Anisotropy, Denoising, Inspection, Data modeling, Image denoising, Neural networks, Metrology, Image processing, Algorithm development

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Proceedings Article | 20 March 2020 Presentation + Paper

Realizing more accurate OPC models by utilizing SEM contours

Yosuke Okamoto, Masahiro Oya, Kotaro Maruyama, Yuichiro Yamazaki, Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Sayantan Das, Sandip Halder, Werner Gillijns

Proceedings Volume 11325, 1132524 (2020) https://doi.org/10.1117/12.2554527

KEYWORDS: Scanning electron microscopy, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Metrology, Image processing, 3D modeling, Photomasks, Image quality

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