Dr. Mohamed S. El-Morsi Profile

Dr. Mohamed S. El-Morsi

Postdoctoral at Univ of Wisconsin Madison

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 21 March 2006 Paper

CFD analysis of the receding meniscus in immersion lithography

Mohamed El-Morsi, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proceedings Volume 6154, 61544E (2006) https://doi.org/10.1117/12.657157

KEYWORDS: Semiconducting wafers, Liquids, Capillaries, Protactinium, Fluid dynamics, Immersion lithography, Data modeling, Computational fluid dynamics, Image processing, Microfluidics

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SPIE Journal Paper | 1 January 2006

Contamination transport in immersion lithography

Gregory Nellis, Mohamed El-Morsi, Chris Van Peski, Andrew Grenville

JM3, Vol. 5, Issue 01, 013007, (January 2006) https://doi.org/10.1117/12.10.1117/1.2167947

KEYWORDS: Contamination, Semiconducting wafers, Immersion lithography, Diffusion, Microfluidics, Absorption, Liquids, Water, Transmittance, Photoresist processing

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SPIE Journal Paper | 1 January 2006

Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Chris Van Peski, Andrew Grenville

JM3, Vol. 5, Issue 01, 013008, (January 2006) https://doi.org/10.1117/12.10.1117/1.2158818

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Quartz, Image processing, Microfluidics, Cameras, Glasses, Fluid dynamics, Calcium

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Proceedings Article | 6 December 2004 Paper

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Benjamin Spike, Chris Van Peski, Andrew Grenville, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569295

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Cameras, Fluid dynamics, Nitrogen, Image processing, Imaging systems, Refractive index, Water

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Proceedings Article | 6 December 2004 Paper

Gas flow modeling for focused ion beam (FIB) repair processes

Mohamed El-Morsi, Alexander Wei, Gregory Nellis, Roxann Engelstad, Sybren Sijbrandij, Diane Stewart, Hans Mulders

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570268

KEYWORDS: Ion beams, 3D modeling, Systems modeling, Process modeling, Photomask technology, Photomasks, Gases, Computational fluid dynamics, Computing systems, Statistical modeling

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