Prof. Timothy A. Shedd Profile

Prof. Timothy A. Shedd

Assistant Professor at Florida Polytechnic Univ

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 1 July 2008

Improved model for liquid loss at a dynamic contact line including behaviors of high-index fluids

Paul Harder, Timothy Shedd

JM3, Vol. 7, Issue 03, 033002, (July 2008) https://doi.org/10.1117/12.10.1117/1.2964214

KEYWORDS: Liquids, Data modeling, Fluid dynamics, Thin films, Water, Semiconducting wafers, Microfluidics, Immersion lithography, Quartz, Velocity measurements

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Contact angles and liquid loss behavior of high index fluids

Paul Harder, Timothy Shedd

Proceedings Volume 6533, 653305 (2007) https://doi.org/10.1117/12.734338

KEYWORDS: Liquids, Data modeling, Thin films, Semiconducting wafers, Fluid dynamics, Water, Immersion lithography, Cameras, Particles, High speed cameras

Read Abstract +

SPIE Journal Paper | 1 April 2007

Prediction of the velocity at which liquid separates from a moving contact line

Scott Schuetter, Timothy Shedd, Gregory Nellis

JM3, Vol. 6, Issue 02, 023003, (April 2007) https://doi.org/10.1117/12.10.1117/1.2727490

KEYWORDS: Liquids, Velocity measurements, Fluid dynamics, Capillaries, Image processing, Data modeling, Interfaces, Semiconducting wafers, Chromium, Microfluidics

Read Abstract +

Proceedings Article | 20 October 2006 Paper

A model to predict the critical velocity for liquid loss from a receding meniscus

Timothy Shedd, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proceedings Volume 6349, 634904 (2006) https://doi.org/10.1117/12.693286

KEYWORDS: Liquids, Immersion lithography, Interfaces, Data modeling, Solids, Semiconducting wafers, Fluid dynamics, Capillaries, Microfluidics, Semiconductors

Read Abstract +

Proceedings Article | 21 June 2006 Paper

A correlation for predicting film-pulling velocity in immersion lithography

Scott Schuetter, Timothy Shedd, Keith Doxtator, Gregory Nellis, Chris Van Peski

Proceedings Volume 6281, 62810Q (2006) https://doi.org/10.1117/12.692706

KEYWORDS: Semiconducting wafers, Liquids, Immersion lithography, Wafer testing, Fluid dynamics, Image processing, Velocity measurements, Optical lithography, Capillaries, Interfaces

Read Abstract +

Proceedings Article | 11 April 2006 Paper

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis

Proceedings Volume 6153, 615307 (2006) https://doi.org/10.1117/12.659392

KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

Read Abstract +

SPIE Journal Paper | 1 April 2006

Measurements of the dynamic contact angle for conditions relevant to immersion lithography

Scott Schuetter, Timothy Shedd, Keith Doxtator, Gregory Nellis, Chris Van Peski, Andrew Grenville, Shang-Ho Lin, Dah-Chung Owe-Yang

JM3, Vol. 5, Issue 02, 023002, (April 2006) https://doi.org/10.1117/12.10.1117/1.2198540

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Experimental characterization of the receding meniscus under conditions associated with immersion lithography

Timothy Shedd, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proceedings Volume 6154, 61540R (2006) https://doi.org/10.1117/12.658894

KEYWORDS: Liquids, Immersion lithography, Interfaces, Data modeling, Semiconducting wafers, Solids, Semiconductors, Fluid dynamics, Capillaries, Refractive index

Read Abstract +

SPIE Journal Paper | 1 January 2006

Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Chris Van Peski, Andrew Grenville

JM3, Vol. 5, Issue 01, 013008, (January 2006) https://doi.org/10.1117/12.10.1117/1.2158818

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Quartz, Image processing, Microfluidics, Cameras, Glasses, Fluid dynamics, Calcium

Read Abstract +

SPIE Journal Paper | 1 July 2005

General model for estimating bubble dissolution and droplet evaporation times

Timothy Shedd

JM3, Vol. 4, Issue 03, 033004, (July 2005) https://doi.org/10.1117/12.10.1117/1.2037427

KEYWORDS: Liquids, Nitrogen, Diffusion, Immersion lithography, Interfaces, Solids, Spherical lenses, Semiconducting wafers, Protactinium, Molecules

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Benjamin Spike, Chris Van Peski, Andrew Grenville, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569295

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Cameras, Fluid dynamics, Nitrogen, Image processing, Imaging systems, Refractive index, Water

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Scattering in liquid immersion lithography

Michael Switkes, Theodore Bloomstein, Roderick Kunz, Mordechai Rothschild, J. Ruberti, T. Shedd, Michael Yeung

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534194

KEYWORDS: Liquids, Scattering, Immersion lithography, Rayleigh scattering, Interfaces, Water, Scatter measurement, Raman scattering, Semiconducting wafers, Lithography

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years