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Nobuyasu Horiuchi
President at Nippon Control System Corp
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Publications (10)
Proceedings Article | 20 May 2006 Paper
New proximity effect correction for under 100 nm patterns
Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda
Proceedings Volume 6283, 62832L (2006) https://doi.org/10.1117/12.681796
KEYWORDS: Scattering, Parallel processing, Modulation, Energy efficiency, Computer simulations, Detection and tracking algorithms, Data modeling, Control systems, Electron beam direct write lithography, Computing systems
Proceedings Article | 24 March 2006 Paper
New proximity effect correction for under 100nm patterns
Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda
Proceedings Volume 6151, 615128 (2006) https://doi.org/10.1117/12.656079
KEYWORDS: Scattering, Data conversion, Data centers, Computer aided design, Data corrections, Solid modeling, Mirrors, Data compression, Control systems, Electron beam direct write lithography
Proceedings Article | 28 June 2005 Paper
NGL data conversion system
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617294
KEYWORDS: Data conversion, Photomasks, Charged-particle lithography, Computer aided design, Electron beam direct write lithography, Inspection, Distortion, Mirrors, Data processing, Data compression
Proceedings Article | 6 May 2005 Paper
NGL data conversion system
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598389
KEYWORDS: Data conversion, Photomasks, Computer aided design, Charged-particle lithography, Inspection, Electron beam direct write lithography, Mirrors, Local area networks, Data corrections, Distortion
Proceedings Article | 20 August 2004 Paper
EPL data conversion system
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557779
KEYWORDS: Data conversion, Photomasks, Inspection, Computer aided design, Data corrections, Semiconducting wafers, Logic, Control systems, Semiconductors, Data compression
Showing 5 of 10 publications
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