Dr. Qiang Wu
Assistant Director at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (14)

SPIE Journal Paper | 23 April 2018
Ling Ma, Qiang Wu, Lisong Dong, Qiaoqiao Li, Yayi Wei, Tianchun Ye
JM3, Vol. 17, Issue 02, 023502, (April 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023502
KEYWORDS: Semiconducting wafers, Particles, Optical lithography, Nitrogen, Photomasks, Semiconductor manufacturing, Lithium, Lithography, Fluid dynamics, Photoresist materials

SPIE Journal Paper | 13 September 2017
Lijun Zhao, Lisong Dong, Wenhui Chen, Yayi Wei, Tianchun Ye, Liwan Yue, Yuntao Jiang, Qiang Wu
JM3, Vol. 16, Issue 03, 033509, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033509
KEYWORDS: Source mask optimization, Data modeling, Calibration, Photoresist processing, Semiconducting wafers, Wafer-level optics, Image processing, Electroluminescence, Critical dimension metrology, Diffusion

Proceedings Article | 8 March 2016 Paper
Guogui Deng, Jingan Hao, Lihong Xiao, Bin Xing, Yuntao Jiang, Kaiting He, Qiang Zhang, Weiming He, Chang Liu, Yi-Shih Lin, Qiang Wu, Xuelong Shi
Proceedings Volume 9778, 97782C (2016) https://doi.org/10.1117/12.2220013
KEYWORDS: Overlay metrology, Process control, Etching, Chemical vapor deposition, Semiconductors, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Photoresist materials, Lithography, Oxides, Optical lithography

Proceedings Article | 10 April 2015 Paper
Weiming He, Huayong Hu, Qiang Wu
Proceedings Volume 9424, 94242M (2015) https://doi.org/10.1117/12.2085457
KEYWORDS: Semiconducting wafers, Photomasks, Immersion lithography, Double patterning technology, Photoresist materials, Image processing, Manufacturing, Optical lithography, Photoresist developing, Natural surfaces

Proceedings Article | 19 March 2015 Paper
Guogui Deng, Jingan Hao, Bin Xing, Yuntao Jiang, Gaorong Li, Qiang Zhang, Liwan Yue, Yanlei Zu, Huayong Hu, Chang Liu, Manhua Shen, Shijian Zhang, Weiming He, Nannan Zhang, Yi-Shih Lin, Qiang Wu, Xuelong Shi
Proceedings Volume 9424, 94242I (2015) https://doi.org/10.1117/12.2086093
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Electron beams, Metals, Optical proximity correction, Inspection, Process control, Electron microscopes, Semiconductors, Control systems

Showing 5 of 14 publications
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