CONFERENCE PROCEEDINGS
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Sabrina Wong
at DuPont Electronics & Industrial
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Author
Publications (5)
Proceedings Article | 9 April 2024 Paper
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo
Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297
KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography
Proceedings Article | 1 May 2023 Poster + Paper
Metallic contamination reduction in polymer solution using membrane purification technology
Pranesh Muralidhar, Antonio Ramirez, Aiwen Wu, Lawrence Chen, Yamin Liu, Luxi Shen, Robert Blacksmith, Sabrina Wong, Matthew Melanson, Andrey Rudenko
Proceedings Volume 12498, 124981L (2023) https://doi.org/10.1117/12.2657698
KEYWORDS: Metals, Polymers, Tunable filters, Chromium, Contamination, Zinc, Photoresist materials, Iron, Calcium, Aluminum
Proceedings Article | 13 June 2022 Presentation
Improving wet etch resistance of organic underlayers
Proceedings Volume PC12055, PC1205508 (2022) https://doi.org/10.1117/12.2612350
KEYWORDS: Wet etching, Resistance, Metals, Etching, Tin, Image processing, Titanium, Polymers, Polymer thin films, Plasma
Proceedings Article | 25 May 2022 Poster + Paper
Removing metallic contaminants from photochemical solvents using advanced purification technologies
Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, Lawrence Chen
Proceedings Volume 12055, 120550V (2022) https://doi.org/10.1117/12.2614308
KEYWORDS: Metals, Iron, Optical lithography, Zinc, Calcium, Sodium, Aluminum, Magnesium, Copper
Proceedings Article | 22 February 2021 Presentation + Paper
Reducing the absorbance of a high etch resistant spin-on carbon hardmask
Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630
KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography
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