Dr. Seul-Gi Kim Profile

Dr. Seul-Gi Kim

at Korea Electronics Technology Institute

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Author

Publications (4)

Proceedings Article | 21 November 2023 Poster + Paper

Direct growth of highly uniform graphite on SiNx/Si through metal induced crystallization of amorphous carbon for EUV pellicle

Hye-Young Kim, Jun-Hyeok Jeon, Kihun Seong, Yongkyung Kim, Seul-Gi Kim, Hyun-Mi Kim, Hyeongkeun Kim, Ji-Beom Yoo

Proceedings Volume 12750, 1275017 (2023) https://doi.org/10.1117/12.2687573

KEYWORDS: Graphite, Pellicles, Metals, Extreme ultraviolet, Crystallization, Film thickness, Amorphous carbon, Nickel, Emissivity, Annealing

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Proceedings Article | 21 November 2023 Poster + Paper

Development of thermal emissivity calculation method for transmissive multilayer nanomembranes

Kihun Seong, Yongkyung Kim, Hye-Young Kim, Sung Kyu Jang, Sangsul Lee, Jiho Kim, Jaeboong Choi, Hyun-Mi Kim, Seul-Gi Kim, Hyeongkeun Kim

Proceedings Volume 12750, 127500W (2023) https://doi.org/10.1117/12.2686696

KEYWORDS: Ruthenium, Emissivity, Matrices, Pellicles, Multilayers, Extreme ultraviolet, Transmittance, Reflectivity, Radio propagation, Refractive index

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Proceedings Article | 21 November 2023 Presentation + Paper

Molybdenum carbide pellicle for high-power EUV lithography

Yongkyung Kim, Kihun Seong, Jonghyuk Yoon, Donggi Lee, Seungchan Moon, Sung Kyu Jang, Hyun-Mi Kim, Seul-Gi Kim, Jinho Ahn, Hyeongkeun Kim

Proceedings Volume 12750, 127500L (2023) https://doi.org/10.1117/12.2686314

KEYWORDS: Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, Plasma, Molybdenum, Transmittance, Hydrogen, High volume manufacturing, Semiconducting wafers, Scattering

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Proceedings Article | 11 November 2022 Presentation

Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle

Yongkyung Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn

Proceedings Volume PC12292, PC122920H (2022) https://doi.org/10.1117/12.2643003

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Molybdenum, Hydrogen, Transmittance, Photomasks, Scattering, Scanners, Plasma

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