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Shuo Liu
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Lithography PR profile improvement and defects reduction by film pre-treatment
Proceedings Volume 11611, 1161134 (2021) https://doi.org/10.1117/12.2583833
KEYWORDS: Lithography, Reflectivity, Scanning electron microscopy, Silicon, Photoresist materials, Line width roughness, Semiconducting wafers, Etching, Coating
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