Dr. Sue Ryeon Kim Profile

Dr. Sue Ryeon Kim

Principal Engineer at Samsung Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 4 March 2010 Paper

Immersion BARC for hyper NA applications II

Yu-Chin Huang, Kai-Lin Chuang, Tsung-Ju Yeh, Steven Wu, Bill Lin, Wen-Liang Huang, Bo-Jou Lu, E. Liu, Chun Chi Yu, Chaoyang Lin, Jeong Yun Yu, Greg Prokopowicz, Sue Ryeon Kim, Sabrina Wong, George Barclay

Proceedings Volume 7640, 76403F (2010) https://doi.org/10.1117/12.848454

KEYWORDS: Reflectivity, Metals, Line width roughness, Logic devices, Multilayers, Etching, Lithography, Control systems, Immersion lithography, Back end of line

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Proceedings Article | 10 April 2009 Paper

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

Sabrina Wong, Jeong Yun Yu, Sue Ryeon Kim, Mike Mori, Amy Kwok, Kathleen O'Connell, George Barclay, Ki Lyoung Lee, Sung Koo Lee, Cheol Kyu Bok

Proceedings Volume 7273, 727318 (2009) https://doi.org/10.1117/12.816448

KEYWORDS: Reflectivity, Double patterning technology, Immersion lithography, Multilayers, Silicon, Interfaces, Optical lithography, Lithography, Etching, Control systems

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Proceedings Article | 10 April 2009 Paper

Immersion BARC for hyper NA applications

Wan-Ju Tseng, Wen Liang Huang, Bill Lin, Bo Jou Lu, Tsung Ju Yeh, E. T. Liu, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Sook Lee, Sabrina Wong, Chaoyang Lin, Maurizio Ciambra, Suzanne Coley, David Praseuth, Kathleen O'Connell, George Barclay

Proceedings Volume 7273, 727317 (2009) https://doi.org/10.1117/12.816393

KEYWORDS: Reflectivity, Metals, Multilayers, Etching, Line width roughness, Lithography, Control systems, Optical lithography, Logic devices, Tin

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Proceedings Article | 15 April 2008 Paper

Reflection control for immersion lithography at 45/32-nm nodes

Wan-Ju Tseng, Ruei-Hung Hsu, Shu Huei Hou, Tzu-Huai Tseng, Bill Lin, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Maurizio Ciambra, Suzanne Coley, David Praseuth, Nick Pugliano

Proceedings Volume 6923, 69232Z (2008) https://doi.org/10.1117/12.776671

KEYWORDS: Metals, Lithography, Reflectivity, Optical lithography, Line width roughness, Immersion lithography, Reflection, Logic devices, Critical dimension metrology, Etching

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