CONFERENCE PROCEEDINGS
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Sushil S. Sakhare
at imec
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Publications (4)
Proceedings Article | 16 March 2016 Paper
Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs
Proceedings Volume 9781, 978102 (2016) https://doi.org/10.1117/12.2218361
KEYWORDS: Nanowires, Field effect transistors, Extreme ultraviolet lithography, Design for manufacturability, Manufacturing, Transistors, Metals, Lithography, Logic, Optical lithography, Photovoltaics, Gallium arsenide, CMOS technology, Diffusion, Electrodes
Proceedings Article | 18 March 2015 Paper
DTCO at N7 and beyond: patterning and electrical compromises and opportunities
Julien Ryckaert, Praveen Raghavan, Pieter Schuddinck, Huynh Bao Trong, Arindam Mallik, Sushil Sakhare, Bharani Chava, Yasser Sherazi, Philippe Leray, Abdelkarim Mercha, Jürgen Bömmels, Gregory McIntyre, Kurt Ronse, Aaron Thean, Zsolt Tökei, An Steegen, Diederik Verkest
Proceedings Volume 9427, 94270C (2015) https://doi.org/10.1117/12.2178997
KEYWORDS: Optical lithography, Metals, Transistors, Standards development, Logic, Resistance, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Field effect transistors
Proceedings Article | 18 March 2015 Paper
Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
Sushil Sakhare, Darko Trivkovic, Tom Mountsier, Min-Soo Kim, Dan Mocuta, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa
Proceedings Volume 9427, 94270O (2015) https://doi.org/10.1117/12.2086100
KEYWORDS: Optical lithography, Nano opto mechanical systems, Metals, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Critical dimension metrology, Scanners, Lithography, Reliability
Proceedings Article | 28 March 2014 Paper
Design technology co-optimization for a robust 10nm Metal1 solution for logic design and SRAM
Proceedings Volume 9053, 90530Q (2014) https://doi.org/10.1117/12.2048079
KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Etching, Extreme ultraviolet, Argon, Logic, Lithography, Computational lithography, Double patterning technology
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