Ms. Tae-Yi Kim Profile

Tae-Yi Kim

at Hanyang Univ.

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Publications (1)

Proceedings Article | 22 February 2021 Poster + Paper

Line width roughness variation and printing failures caused by stochastic effect at extreme-ultraviolet exposure

In-Hwa Kang, Tae-Yi Kim, Su-Mi Hur, Chung-Hyun Ban, Jang-Gun Park, Hye-Keun Oh

Proceedings Volume 11609, 116091K (2021) https://doi.org/10.1117/12.2583690

KEYWORDS: Line width roughness, Extreme ultraviolet, Stochastic processes, Polymers, Extreme ultraviolet lithography, Chemical reactions, Quenching (fluorescence), Photoresist materials, Manufacturing, Ionization

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