Mr. Jang-Gun Park Profile

Jang-Gun Park

at Hanyang Univ

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Author

Publications (5)

Proceedings Article | 1 December 2022 Poster + Paper

Estimation of mechanical stability of EUV pellicle by the collision of the particle defect

Ji-Won Kang, Won-Young Choi, Hee-Chang Ko, Jang-Gun Park, Min-Woo Kim, Jun-Hyeung Lee, Hye-Keun Oh

Proceedings Volume 12292, 122920S (2022) https://doi.org/10.1117/12.2643119

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Graphene, Silicon carbide, Transmittance, Extreme ultraviolet lithography, Photomasks, Image processing, Semiconducting wafers

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Proceedings Article | 31 October 2022 Poster

Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, Hyekeun Oh

Proceedings Volume PC12292, PC122920R (2022) https://doi.org/10.1117/12.2643047

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Absorption, Thin films, Semiconducting wafers, Photoresist materials, Overlay metrology, Thin film manufacturing, Thin film deposition, Semiconductors

Proceedings Article | 26 May 2022 Poster + Paper

Optimal thickness of phase shift mask considering phase and reflectance in high NA EUV contact-hole pattern

Jang-Gun Park, Min-Woo Kim, Ji-Won Kang, Hee-Chang Ko, Jun-Hyung Lee, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12051, 120510O (2022) https://doi.org/10.1117/12.2613984

KEYWORDS: Reflectivity, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Phase shifts, Stochastic processes, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, 3D image processing

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Proceedings Article | 12 October 2021 Presentation + Paper

Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

In-Hwa Kang, Jang-Gun Park, Min-Woo Kim, Jun-Hyeong Lee, Hye-Keun Oh

Proceedings Volume 11855, 118550P (2021) https://doi.org/10.1117/12.2602035

KEYWORDS: Reflectivity, Photomasks, Phase shifts, Diffraction, Extreme ultraviolet, Image processing, Optical lithography, Image quality, Extreme ultraviolet lithography, Absorption

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Proceedings Article | 22 February 2021 Poster + Paper

Line width roughness variation and printing failures caused by stochastic effect at extreme-ultraviolet exposure

In-Hwa Kang, Tae-Yi Kim, Su-Mi Hur, Chung-Hyun Ban, Jang-Gun Park, Hye-Keun Oh

Proceedings Volume 11609, 116091K (2021) https://doi.org/10.1117/12.2583690

KEYWORDS: Line width roughness, Extreme ultraviolet, Stochastic processes, Polymers, Extreme ultraviolet lithography, Chemical reactions, Quenching (fluorescence), Photoresist materials, Manufacturing, Ionization

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