Dr. Thomas Nuytten Profile

Dr. Thomas Nuytten

at imec

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Publications (5)

SPIE Journal Paper | 27 July 2021

Carbon nanotube EUV pellicle tunability and performance in a scanner-like environment

Marina Timmermans, Ivan Pollentier, Maxim Korytov, Thomas Nuytten, Stefanie Sergeant, Thierry Conard, Johan Meersschaut, Yide Zhang, Masoud Dialameh, Wilfried Alaerts, Ehsan Jazaeri, Valentina Spampinato, Alexis Franquet, Steven Brems, Cedric Huyghebaert, Emily Gallagher

JM3, Vol. 20, Issue 03, 031010, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031010

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Raman spectroscopy, Scanners, Carbon, Carbon nanotubes, Plasma, Particles, Coating

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Background: An extreme ultraviolet (EUV)-transparent pellicle must be used during lithography to protect the photomask from fall-on particles. A pellicle made of free-standing carbon nanotube (CNT) films stops particles despite the presence of gaps while demonstrating high EUV transmission, mechanical stability, low EUV scattering and reflectivity, and DUV transmission that enables through-pellicle mask inspection. Aim: The CNT EUV pellicle properties can be tailored based on the diversity of CNT structures and tunability of their configuration within the CNT film (density, bundle size, composition, etc.) as shown in this work. A remaining challenge is extending the CNT EUV pellicle lifetime in the scanner environment of EUV-induced hydrogen-based plasma, and the effects on different CNT films are explored here. Approach: Optical and thermal properties of different CNT pellicles with respect to the CNT material type, density, composition, and bundle size were explored. The ability of uncoated CNT EUV pellicles to withstand high EUV powers in the hydrogen-based environment was tested. Transmission, spectroscopic, and chemical mapping of the exposed CNT membranes were performed to explore the material modifications under various exposure conditions. Results: Uncoated CNT pellicles withstand 600-W source power equivalent in the EUV scanner-like gas environment but exhibit structural changes with prolonged exposure. Multiwalled CNT pellicles exhibit less EUV transmission change as compared to single-walled CNT pellicles under the same exposure conditions. The protection of CNT material from structural degradation by means of coating was shown. Conclusions: These investigations add to the understanding of CNT EUV pellicle tunability for optimal performance and lifetime limiters of CNT pellicles under the influence of EUV radiation and plasma. We anticipate the need for coating the CNT pellicle to protect the CNT material against plasma damage for the current scanner conditions. Optimization of both the CNT membrane and its coating is in progress.

Proceedings Article | 23 March 2021 Presentation + Paper

CNT EUV pellicle tunability and performance in a scanner-like environment

Proceedings Volume 11609, 116090Y (2021) https://doi.org/10.1117/12.2584519

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Scanners, Plasma, Thermography, Photomask technology, Hydrogen, Spectroscopy

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Proceedings Article | 22 February 2021 Presentation

Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

Fabian Holzmeier, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Stefan Böttcher, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen

Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038

KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

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Proceedings Article | 22 February 2021 Presentation

Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source

Kevin Dorney, Sonia Castellanos, Esben Larsen, Fabian Holzmeier, Dhirendra Singh, Nadia Vandenbroeck, Danilo De Simone, Peter De Schepper, Alessandro VaglioPret, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kaptyen, Thomas Nuytten, Paul Van der Heide, John Petersen

Proceedings Volume 11610, 1161011 (2021) https://doi.org/10.1117/12.2595048

KEYWORDS: Lithography, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Ultrafast phenomena, Photoresist materials, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 22 February 2021 Presentation + Paper

Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

J. Bogdanowicz, Y. Oniki, K. Kenis, Y. Muraki, T. Nuytten, S. Sergeant, A. Franquet, V. Spampinato, T. Conard, I. Hoflijk, J. Meersschaut, N. Claessens, A. Moussa, D. Van Den Heuvel, J. Hung, R. Koret, A.-L. Charley, P. Leray

Proceedings Volume 11611, 116111Q (2021) https://doi.org/10.1117/12.2581800

KEYWORDS: Etching, Metrology, Transistors, Spectroscopes, Raman spectroscopy, Critical dimension metrology, Spectroscopy, Photoemission spectroscopy, X-rays, Scanning electron microscopy

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