Dr. Uwe F.W. Behringer Profile

Dr. Uwe F.W. Behringer

Managing Director at UBC Microelectronics

SPIE Involvement:

Conference Program Committee | Editor | Author

Publications (4)

Proceedings Article | 6 December 2004 Paper

1x stencil masks fabrication and their use in Low-Energy Electron-Beam Proximity Lithography (LEEPL)

Uwe Behringer

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579748

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electron beam lithography, Distortion, Silicon, Lithography, Optical lithography, Printing, Mask making

Read Abstract +

Thirty years ago it was the common believe of most of the lithographer that the limit end for the optical lithography will be at about 1 μm ground rule. So NGL tools were developed to go in the 500nm and 250nm regions. 15 years later the different optical lithography techniques were still alive exposing feature sizes down to 200nm and the NGL tool developer had to move to 100nm and below. Today 100nm features made by optical lithography is world wide a common technique in most of the modern chip manufacturing plants, and feature sizes beyond the used wavelength are state of art. So do we really need NGL or will the optical lithography lives forever? Well, there are already optical system available or will be soon delivered to the manufacturing lines which are able to expose feature sizes down to 70nm and even to 50nm if they use 193nm immersion lithography. But for what price? The optical lithography became extremely expensive. Reticles for the 70nm technology full with OPC structures may cost up to $ 500 K and an optical reticle set up to $ 2 Million. So in my understanding the introduction of any NGL technique will only happen if such a technique can demonstrate at least the same performance as the optical lithography but at a lower cost level. The best understood NGLs are the electron beam lithography techniques used in e-beam direct writing tools for the exposure of masks and reticles or e-beam techniques which expose the wafers using masks like E-beam Projection Lithography (EPL) or Low Energy E-beam Proximity Lithography (LEEPL) respectively. Both EPL and LEEPL require a similar mask technique so called stencil masks. The first 1x stencil masks (a silicon wafer with a thin membrane area containing the pattern as physical holes) were developed by IBM Germany more than 25 years ago and perfected in the Advanced Mask Facility (AMF) at IBM Vermont. Today, these 1x stencil masks used for LEEPL are mainly produced by Hoya, DNP, Toppan and NTT-AT in Japan. This paper will explain the different fabrication processes for the stencil masks, their different shapes and their performance used for LEEPL.

Proceedings Article | 2 June 2004 Paper

Low-energy electron beam proximity projection lithography (LEEPL): the world's first e-beam production tool, LEEPL 3000

Uwe Behringer

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568029

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electron beam lithography, Lithography, Silicon, Manufacturing, Electron beams, Projection lithography, Distortion

Read Abstract +

Proceedings Article | 23 April 1999 Paper

Future reticle demand and next-generation lithography technologies

Uwe Behringer, Christian Ehrlich, Olaf Fortange

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346206

KEYWORDS: Photomasks, Lithography, Reticles, Semiconducting wafers, X-ray lithography, Semiconductors, X-rays, Silicon, Manufacturing, X-ray technology

Read Abstract +

Proceedings Article | 20 January 1994 Paper

Passive optical devices in polymers

Werner Frank, Frank Linke, Alexander Schoesser, Torsten Strempel, Stefan Brunner, Dorothee Rueck, Uwe Behringer, Theo Tschudi, Hilmar Franke, Tomas Sterkenburgh

Proceedings Volume 2042, (1994) https://doi.org/10.1117/12.166319

KEYWORDS: Waveguides, Photomasks, Silicon, Semiconducting wafers, Polymethylmethacrylate, Polymers, Ions, Prisms, Optical components, Ion beams

Read Abstract +

Proceedings Volume Editor (24)

SPIE Conference Volume | 1 November 2022

37th European Mask and Lithography Conference

SPIE Conference Volume | 25 September 2018

34th European Mask and Lithography Conference

SPIE Conference Volume | 18 October 2017

33rd European Mask and Lithography Conference

SPIE Conference Volume | 26 October 2016

32nd European Mask and Lithography Conference

SPIE Conference Volume | 18 September 2015

31st European Mask and Lithography Conference

Showing 5 of 24 publications

Conference Committee Involvement (53)

Photomask Technology 2025

21 September 2025 | Monterey, California, United States

40th European Mask and Lithography Conference (EMLC 2025)

16 June 2025 | Dresden, Germany

Photomask Technology 2024

30 September 2024 | Monterey, California, United States

39th European Mask and Lithography Conference (EMLC 2024)

17 June 2024 | Grenoble, France

Photomask Technology 2023

2 October 2023 | Monterey, California, United States

38th European Mask and Lithography Conference

19 June 2023 | Dresden, Germany

Photomask Technology 2022

26 September 2022 | Monterey, California, United States

37th European Mask and Lithography Conference

20 June 2022 | Leuven, Belgium

Photomask Technology

27 September 2021 | Online Only, United States

Photomask Technology

21 September 2020 | Online Only, California, United States

36th European Mask and Lithography Conference

22 June 2020 | Leuven, Belgium

Photomask Technology

16 September 2019 | Monterey, California, United States

35th European Mask and Lithography Conference (EMLC 2019)

17 June 2019 | Dresden, Germany

Photomask Technology

17 September 2018 | Monterey, California, United States

34th European Mask and Lithography Conference

18 June 2018 | Grenoble, France

33rd European Mask and Lithography Conference

26 June 2017 | Dresden, Germany

32nd European Mask and Lithography Conference

21 June 2016 | Dresden, Germany

31st European Mask and Lithography Conference

22 June 2015 | Eindhoven, Netherlands

30th European Mask and Lithography Conference

24 June 2014 | Dresden, Germany

29th European Mask and Lithography Conference

25 May 2013 | Dresden, Germany

28th European Mask and Lithography Conference (EMLC 2012)

17 January 2012 | Dresden, Germany

27th European Mask and Lithography Conference

18 January 2011 | Dresden, Germany

26th European Mask and Lithography Conference

18 January 2010 | Grenoble, France

Photomask Technology

15 September 2009 | Monterey, California, United States

25th European Mask and Lithography Conference

12 January 2009 | Dresden, Germany

Photomask Technology

7 October 2008 | Monterey, California, United States

24th European Mask and Lithography Conference

21 January 2008 | Dresden, Germany

Photomask Technology

18 September 2007 | Monterey, California, United States

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

23rd European Mask and Lithography Conference

22 January 2007 | Grenoble, France

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

22nd European Mask and Lithography Conference

23 January 2006 | Dresden, Germany

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Emerging Lithographic Technologies IX

1 March 2005 | San Jose, California, United States

21st European Mask and Lithography Conference

31 January 2005 | Dresden, Germany

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Emerging Lithographic Technologies VIII

24 February 2004 | Santa Clara, California, United States

20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

12 January 2004 | Dresden, Germany

Photomask Technology

9 September 2003 | Monterey, California, United States

Nanofabrication Technologies

3 August 2003 | San Diego, California, United States

Emerging Lithographic Technologies VII

25 February 2003 | Santa Clara, California, United States

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

13 January 2003 | Sonthofen, Germany

MEMS/MOEMS for Photonic Communications, Sensing and Metrology

29 October 2002 | Bruges, Belgium

Photomask Technology

1 October 2002 | Monterey, CA, United States

18th European Mask Conference on Mask Technology for Integrated Circuits and Microcomponents

15 January 2002 | Munich-Unterhaching, Germany

18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components

15 January 2002 | Munich-Unterhaching, Germany

MEMS Design, Fabrication, Characterization, and Packaging

30 May 2001 | Edinburgh, United Kingdom

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

13 November 2000 | Munich, Germany

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

13 November 2000 | Munich, Germany

Mask Technology for Integrated Circuits and Micro-Components

15 November 1999 | Munich, Germany

16th European Conference on Mask Technology for Integrated Circuits and Microcomponents

15 November 1999 | Munich, Germany

Mask Technology for Integrated Circuits and Micro-Components '98

16 November 1998 | Munich, Germany

15th European Conference on Mask Technology for Integrated Circuits and Micro-Components

16 November 1998 | Munich, Germany

Showing 5 of 53 Conference Committees

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