Dr. Woojoo Sim Profile

Dr. Woojoo Sim

Principal Scientist at Standigm

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation

Advancing the curvilinear ILT and OPC ecosystem for low-k1 DUV and EUV lithography

Guangming Xiao, Kevin Hooker, Yunqiang Zhang, Ji Li, Thuc Dam, Yu-Po Tang, Linghui Wu, WooJoo Sim, Kevin Lucas

Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637

KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

Read Abstract +

Proceedings Article | 20 March 2019 Presentation + Paper

Automatic correction of lithography hotspots with a deep generative model

Woojoo Sim, Kibok Lee, Dingdong Yang, Jaeseung Jeong, Ji-Suk Hong, Sooryong Lee, Honglak Lee

Proceedings Volume 10961, 1096105 (2019) https://doi.org/10.1117/12.2514884

KEYWORDS: Lithography, Photomasks, Neural networks, Data modeling, Process modeling, Image classification, Binary data, Image processing, Computational lithography

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyun-Jong Lee, Sungsoo Suh, Jung-Hoon Ser, Seong-Woon Choi, Chang-Jin Kang, Thomas Cecil, Christopher Ashton, David Irby, Xin Zhou, D.H. Son, Guangming Xiao, David Kim

Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 23 March 2011 Paper

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, H. J. Lee, W. J. Sim, M. J. Hong, S. G. Jung, S. S. Suh, S. W. Lee

Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Read Abstract +

Proceedings Article | 29 September 2010 Paper

Improving model prediction accuracy for ILT with aggressive SRAFs

Sunggon Jung, Woojoo Sim, Moongyu Jeong, Junghoon Ser, Sungwoo Lee, Seoung-woon Choi, Xin Zhou, Lan Luan, Thomas Cecil, Donghwan Son, Robert Gleason, David Kim

Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528

KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years