Mr. Sung Gon Jung Profile

Sung Gon Jung

at SAMSUNG Electronics Co Ltd

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Author

Publications (12)

Proceedings Article | 13 November 2024 Presentation

Understanding best focus shift on logic contact patterning in EUV attenuated phase-shift mask

Eun Sung Kim, Sejin Park, Hyungkwan Park, Jaemyoung Lee, Sung Gon Jung

Proceedings Volume PC13215, PC132150I (2024) https://doi.org/10.1117/12.3034344

KEYWORDS: 3D mask effects, Extreme ultraviolet, Optical lithography, Logic, Attenuation, Semiconducting wafers, Phase shifts, Logic devices, Light sources and illumination, Binary data

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Proceedings Article | 23 March 2011 Paper

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyun-Jong Lee, Sungsoo Suh, Jung-Hoon Ser, Seong-Woon Choi, Chang-Jin Kang, Thomas Cecil, Christopher Ashton, David Irby, Xin Zhou, D.H. Son, Guangming Xiao, David Kim

Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

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Proceedings Article | 23 March 2011 Paper

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, H. J. Lee, W. J. Sim, M. J. Hong, S. G. Jung, S. S. Suh, S. W. Lee

Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

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Proceedings Article | 29 September 2010 Paper

Improving model prediction accuracy for ILT with aggressive SRAFs

Sunggon Jung, Woojoo Sim, Moongyu Jeong, Junghoon Ser, Sungwoo Lee, Seoung-woon Choi, Xin Zhou, Lan Luan, Thomas Cecil, Donghwan Son, Robert Gleason, David Kim

Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528

KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

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Proceedings Article | 26 May 2010 Paper

E-beam writing time improvement for inverse lithography technology mask for full-chip

Guangming Xiao, Dong Hwan Son, Tom Cecil, Dave Irby, David Kim, Ki-Ho Baik, Byung-Gook Kim, SungGon Jung, Sung Soo Suh, HanKu Cho

Proceedings Volume 7748, 77481T (2010) https://doi.org/10.1117/12.867995

KEYWORDS: SRAF, Photomasks, Image segmentation, Lithography, Control systems, Stereolithography, Critical dimension metrology, Electron beam lithography, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 19 May 2008 Paper

AF fixer: new incremental OPC method for optimizing assist feature

Sung-Gon Jung, Sang-Wook Kim, Sung-Soo Suh, Young-Chang Kim, Suk-Joo Lee, Sung-Woon Choi, Woo-Sung Han, Joo-Tae Moon, Levi Barnes, Xiaohai Li, Robert Lugg, Sooryong Lee, Kyoil Koo, Munhoe Do, Frank Amoroso, Benjamin Painter

Proceedings Volume 7028, 70280Y (2008) https://doi.org/10.1117/12.793040

KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, Photomasks, Manufacturing, Scanners, Image segmentation, Process modeling, Optical lithography, Data modeling

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Proceedings Article | 24 March 2006 Paper

Improving model-based OPC performance for sub-60nm devices using real source optical model

Sunggon Jung, In-Sung Kim, Young-Seog Kang, Gi-Sung Yeo, Sang-Gyun Woo, HanKu Cho, Joo-Tae Moon

Proceedings Volume 6156, 61561H (2006) https://doi.org/10.1117/12.655954

KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Model-based design, Instrument modeling, Scanners, Optical lithography, Image filtering, Error analysis, Calibration

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Proceedings Article | 14 March 2006 Paper

Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

In-Sung Kim, Sungsoo Suh, Sunggon Jung, Eunmi Lee, Young-Seog Kang, Sukjoo Lee, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 6156, 61560L (2006) https://doi.org/10.1117/12.655482

KEYWORDS: Optical proximity correction, Design for manufacturing, Photomasks, Semiconducting wafers, Visualization, Image quality, Lithography, Manufacturing, Image processing, Critical dimension metrology

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Proceedings Article | 12 May 2005 Paper

The application criterion of model-based optical proximity correction in a low k1 process

Doo-Youl Lee, In-Sung Kim, Sung-Gon Jung, Myoung-Ho Jung, Joo-On Park, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599013

KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Lithography, Scanning electron microscopy, Photography, Process modeling, Photomasks, Scanners, Semiconducting wafers

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Proceedings Article | 24 May 2004 Paper

Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536341

KEYWORDS: Optical proximity correction, Critical dimension metrology, Atrial fibrillation, Cadmium, Resolution enhancement technologies, Data modeling, Logic devices, Photomasks, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 30 July 2002 Paper

Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Insung Kim, Sung-gon Jung, Hyung-Do Kim, Gisung Yeo, In-Gyun Shin, Junghyun Lee, Hanku Cho, Joo-Tae Moon

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474595

KEYWORDS: Transmittance, Lithography, Photomasks, Nanoimprint lithography, Electroluminescence, Scanners, Image transmission, Optical lithography, Image quality, Roads

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Proceedings Article | 30 July 2002 Paper

Effectiveness and confirmation of local area flare measurement method in various pattern layouts

Dongseok Nam, Eunmi Lee, Sung-gon Jung, Young Kang, Gisung Yeo, Junghyun Lee, Hanku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474608

KEYWORDS: Contamination, Critical dimension metrology, Scattering, Light scattering, Reticles, Photomasks, Semiconductors, Standards development, Projection systems, Optical lithography

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Showing 5 of 12 publications

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