Proceedings Article | 9 April 2007
KEYWORDS: Photoresist materials, Photoresist developing, LCDs, Glasses, Chemical elements, Oxygen, Electrodes, Manufacturing, Industrial chemicals, Chemical species
We report on a study of the diazonaphthoquinone (DNQ) positive photoresist composition for LCD. Photoresist is
the important material used for the electrode of LCD. LCD photoresist consists of photoactive compounds, binder
resin and organic solvent. We first study the esterification of 3,4,5-trihydroxybenzophenone, 2,2',4,4'-tetrahydroxybenzophenone and 1,2-DNQ-4-or-5-sulfonylchloride, then the conventional photoactive compounds were
synthesized. The properties of the conventional photoresist composition were also studied. Our work focuses on
exploring new type of photoactive compounds. We prepared the new phenol compounds:
7,8-dihydroxy-4-methylcoumarin, 6,7-dihydroxy-3,3-diphenyl-3H-benzenefuran-2- ketone, and then reacted with 1,2-DNQ-4-or-5-sulfonyl chloride. The new photoactive compounds were used with PGMEA as organic solvent and the
novolac resin as binder resin, then the photoresist composition was prepared. The photoresist composition was
coated on the pretreated ITO films and ITO glasses. After the prebake, exposure, developing, hard bake, a desired
pattern was produced . The properties of photoresist composition, for example: photosensitivity, resolution and
developing performance were good, and the photosensitivity can reach to 40.5mJ.cm-2, the resolution can be 1&mgr;m.
