Dr. Young-Je Yun Profile

Dr. Young-Je Yun

Principal Engineer

SPIE Involvement:

Author

Area of Expertise:

Photolithography , Flare and abberation , EUV lithography

Publications (8)

Proceedings Article | 4 April 2008 Paper

Impact of surface treatment on resist reflow process

Young-Je Yun, Jin-Ho Park, Hakyu Choi, Seung Ryong Park, Kwangseon Choi, Jea-Hee Kim, Jae-Won Han

Proceedings Volume 6923, 69233K (2008) https://doi.org/10.1117/12.772534

KEYWORDS: Critical dimension metrology, Photoresist processing, Head-mounted displays, Glasses, Cadmium, Lithography, Semiconducting wafers, Inspection, Resolution enhancement technologies, Lenses

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Proceedings Article | 24 March 2008 Paper

Impact of assistance feature to pattern profile for isolated feature in sub-65 nm node

Myungsoo Kim, Young-Je Yun, Eunsoo Jeong, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6922, 69221K (2008) https://doi.org/10.1117/12.773109

KEYWORDS: SRAF, Line edge roughness, Artificial intelligence, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Inspection, Wafer-level optics, Metrology

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Proceedings Article | 21 March 2008 Paper

Diffraction feature of microlens array with a small aperture size

Seungryong Park, Jinho Park, Hakyu Choi, Young-Je Yun, Kwangseon Choi, Jeahee Kim

Proceedings Volume 6921, 69212O (2008) https://doi.org/10.1117/12.772480

KEYWORDS: Diffraction, Ray tracing, Copper indium disulfide, Diodes, Finite-difference time-domain method, CMOS sensors, Optical fiber cables, Microlens array, Image processing, Cell phones

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Proceedings Article | 7 March 2008 Paper

Extension of low k1 lithography processes with KrF for 90nm technology node

Sungho Jun, Eunsoo Jeong, Youngje Yun, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6924, 692439 (2008) https://doi.org/10.1117/12.772537

KEYWORDS: Lithography, Critical dimension metrology, Line edge roughness, Etching, Image processing, Resolution enhancement technologies, Photomasks, Optical lithography, Image resolution, Edge roughness

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Proceedings Article | 7 March 2008 Paper

Investigation of mechanism of pattern deformation on TiN substrate and O2 plasma effect without BARC

Juhyoung Moon, Young-Je Yun, Taek-seung Yang, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6924, 69244G (2008) https://doi.org/10.1117/12.773143

KEYWORDS: Oxygen, Photoresist materials, Head-mounted displays, Plasma treatment, Lithography, Tin, Etching, Metals, Statistical analysis, Plasma

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Proceedings Article | 5 April 2007 Paper

Optimization of lithography process to improve image deformation of contact hole sub-90 nm technology node

Sungho Jun, Juhyun Kim, Eunsoo Jeong, Youngje Yun, Jaehee Kim, Keeho Kim

Proceedings Volume 6518, 65183T (2007) https://doi.org/10.1117/12.711978

KEYWORDS: Image processing, Photomasks, Lithography, Edge roughness, Etching, Critical dimension metrology, Image analysis, Resistance, Image resolution, Failure analysis

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Proceedings Article | 26 March 2007 Paper

Flare effect of different shape of illumination apertures in 193-nm optical lithography system

Young-Je Yun, Jeahee Kim, Keeho Kim

Proceedings Volume 6520, 65202T (2007) https://doi.org/10.1117/12.711634

KEYWORDS: Lithographic illumination, Diffraction, Light scattering, Photoresist processing, Lithography, Image processing, Optical lithography, Photomasks, Light, Critical dimension metrology

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Proceedings Article | 20 March 2006 Paper

Flare effect of different shape of illumination apertures in 193-nm optical lithography system

Young-Je Yun, Ju-Hyung Moon, Haeng-Leem Jeon, Jea-Hee Kim, Keeho Kim

Proceedings Volume 6154, 615435 (2006) https://doi.org/10.1117/12.656999

KEYWORDS: Light scattering, Diffraction, Photomasks, Lithographic illumination, Optical lithography, Lithography, Critical dimension metrology, Light, Reflection, Photoresist processing

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Showing 5 of 8 publications

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