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Zhiyang Song
Librarian at Institute of Microelectronics of the Cas
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Publications (5)
SPIE Journal Paper | 20 December 2016
Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node
JM3, Vol. 15, Issue 04, 043509, (December 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043509
KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data
Proceedings Article | 8 March 2016 Paper
A novel mask structure for measuring the defocus of scanner
Proceedings Volume 9778, 97782A (2016) https://doi.org/10.1117/12.2218764
KEYWORDS: Photomasks, Diffraction, Scanners, Phase shifts, Lithography, Opacity, Diffraction gratings, Immersion lithography, Projection systems, Microelectronics
SPIE Journal Paper | 23 November 2015
Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability
Moran Guo, Zhiyang Song, Yaobin Feng, Zhengguo Tian, Qingchen Cao, Yayi Wei
JM3, Vol. 14, Issue 04, 043507, (November 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043507
KEYWORDS: Electroluminescence, Source mask optimization, Photomasks, Optical proximity correction, Computational lithography, Diffractive optical elements, Metals, Lithography, Manufacturing, Optimization (mathematics)
Proceedings Article | 18 March 2015 Paper
Focus shift impacted by mask 3D and comparison between Att. PSM and OMOG
Yansong Liu, Xiaojing Su, LiSong Dong, Zhiyang Song, Moran Guo, Yajuan Su, Yayi Wei
Proceedings Volume 9426, 94261H (2015) https://doi.org/10.1117/12.2085659
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Phase shifts, Opacity, Source mask optimization, Critical dimension metrology, Electroluminescence, Nanoimprint lithography
SPIE Journal Paper | 3 November 2014 Open Access
Fast pixel-based optical proximity correction based on nonparametric kernel regression
JM3, Vol. 13, Issue 04, 043007, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043007
KEYWORDS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF
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