Prof. Xiaojing Su Profile

Prof. Xiaojing Su

at Institute of Microelectronics CAS

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Author

Publications (34)

Proceedings Article | 12 November 2024 Poster + Paper

A semi-empirical approach for predicting LER statistical distribution in advanced nodes

Xin Hong, Xiaojing Su, Zixi Liu, Xiaohuan Ling, Yuqin Wang, Pengyu Ren, Yujie Jiang, Yajuan Su, Yayi Wei

Proceedings Volume 13215, 1321519 (2024) https://doi.org/10.1117/12.3034583

KEYWORDS: Line edge roughness, Stochastic processes, Extreme ultraviolet lithography

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Proceedings Article | 12 November 2024 Poster + Paper

The impact of aberrations in extreme ultraviolet lithography systems on exposure results

Jiashuo Wang, Ziqi Li, Xiaojing Su, Yayi Wei

Proceedings Volume 13215, 132150Z (2024) https://doi.org/10.1117/12.3034457

KEYWORDS: Monochromatic aberrations, Extreme ultraviolet lithography, Zernike polynomials, Lithography, Picosecond phenomena, Pupil aberrations, Source mask optimization, Wavefront aberrations, Wavefronts, Spherical lenses

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Proceedings Article | 10 April 2024 Poster + Paper

Identification of key aberrations that affect pattern imaging in EUVL

Jiashuo Wang, Xiaojing Su, Yayi Wei

Proceedings Volume 12954, 129541A (2024) https://doi.org/10.1117/12.3009886

KEYWORDS: Modeling, Critical dimension metrology, Matrices, Extreme ultraviolet lithography, Process modeling, Mathematical optimization, Light sources and illumination, Wavefront aberrations

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SPIE Journal Paper | 26 October 2023

Selection approach of critical patterns for calibrating the physical resist model based on spectrum coverage

Jiashuo Wang, Lisong Dong, Xiaojing Su, Yajuan Su, Xu Ma, Yayi Wei

JM3, Vol. 22, Issue 04, 043201, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.043201

KEYWORDS: Calibration, Matrices, Amplifiers, Photoresist processing, Light sources and illumination, Diffraction, Semiconducting wafers, Lithography, Quenching, Process modeling

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BackgroundThe resist model is a significant element of computational lithography. Accurate calibration of the resist model is essential to obtain predictive results that closely match the exposure results on wafers. The trade-off between model accuracy and runtime is a challenging task. The selection of critical patterns used in model calibration affects these two metrics directly.AimHaving a dependable method for choosing critical patterns during resist model calibration is essential for lithography engineers with diverse professional backgrounds. Equally important is the ability to decrease runtime while maintaining the precision of calibrated resist models. To address these concerns, we present an approach for selecting critical patterns utilized in resist model calibration.ApproachSince the spectrum carries pattern information, critical patterns are selected based on the coverage of the spectrum in the frequency domain. The spectrum coverage (SCO) of each pattern in the entire test pattern set is calculated according to the frequency and amplitude of all the spectra. Combinations of critical patterns are selected based on their SCO values. The optimal combinations include the most types of spectra and aim to adapt the calibrated model for broad applicability, encompassing both universal and unique patterns.ResultsThe model verification results are compared with the experience-based methods, which select critical patterns based on the pitch-to-CD ratio. The accuracy and effectiveness of the proposed methodology have been demonstrated through experimental results. Compared with experience-based methods that only have dense and isolated critical patterns, our proposed method has a 9.8% increase in accuracy and a 35% decrease in runtime. Even compared with experience-based methods that include forbidden pitches, our method still achieves a 6.4% increase in accuracy without increasing runtime.ConclusionsIn summary, the suggested approach for selecting critical patterns based on SCO surpasses the experience-based methods in terms of both accuracy and efficiency. It can significantly shorten the modeling cycle of resists.

Proceedings Article | 28 April 2023 Paper

Probability model of bridging defects for random logic via in 3nm double patterning technology at 0.33 NA

Xiaojing Su, Jingjing Li, Taian Fan, Jiashuo Wang, Lisong Dong, Yajuan Su, Yayi Wei

Proceedings Volume 12495, 124950C (2023) https://doi.org/10.1117/12.2658126

KEYWORDS: Double patterning technology, Optical lithography, Extreme ultraviolet, Logic, Critical dimension metrology, Source mask optimization, Overlay metrology, Design and modelling

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Proceedings Article | 26 May 2022 Presentation + Paper

A novel contrast-aware SMO at 7nm technology node

Xiaojing Su, Lisong Dong, Yayi Wei, Yajuan Su

Proceedings Volume 12052, 120520H (2022) https://doi.org/10.1117/12.2614140

KEYWORDS: Source mask optimization, Nanoimprint lithography, Photomasks, Lithography, Semiconducting wafers, SRAF, 3D modeling, Optimization (mathematics), Mirrors

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SPIE Journal Paper | 22 November 2021

Hotspot detection in large-scale layout with proposal sampling and feature parameters optimization

Tianyang Gai, Ying Chen, Xiaojing Su, Tong Qu, Shuhan Wang, Yajuan Su, Yayi Wei

JM3, Vol. 20, Issue 04, 041208, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041208

KEYWORDS: Feature extraction, Sensors, Lithography, Data modeling, Convolution, Performance modeling, Neural networks, Visualization, Machine learning, Image processing

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Proceedings Article | 12 October 2021 Presentation + Paper

Acceleration method for source mask optimization at 7nm technology node

Xiaojing Su, Lisong Dong, Yunyun Hao, Yajuan Su, Yayi Wei

Proceedings Volume 11855, 118550Y (2021) https://doi.org/10.1117/12.2600884

KEYWORDS: Source mask optimization, Lithography, SRAF, Photomasks, Etching, Optical lithography

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Proceedings Article | 12 October 2021 Presentation + Paper

Litho-aware redundant local-loop insertion framework with convolutional neural network

Tong Qu, Yibo Lin, Tianyang Gai, Xiaojing Su, Shuhan Wang, Bojie Ma, Yajuan Su, Yayi Wei

Proceedings Volume 11855, 118550L (2021) https://doi.org/10.1117/12.2601685

KEYWORDS: Lithography, Convolutional neural networks, Computer simulations, Neural networks

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SPIE Journal Paper | 15 July 2021

Data augmentation in hotspot detection based on generative adversarial network

Shuhan Wang, Tianyang Gai, Tong Qu, Bojie Ma, Xiaojing Su, Lisong Dong, Libin Zhang, Peng Xu, Yajuan Su, Yayi Wei

JM3, Vol. 20, Issue 03, 034201, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034201

KEYWORDS: Gallium nitride, Data modeling, Performance modeling, Binary data, Machine learning, Statistical modeling, Lithography, Convolution, Computer programming, Microelectronics

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SPIE Journal Paper | 23 March 2021

Projection-based high coverage fast layout decomposing algorithm of metal layer for accelerating lithography friendly design at full chip level

Xiaojing Su, Dong Shen, Yayi Wei, Yajuan Su, Lisong Dong, Rui Chen, Tianyang Gai, Libin Zhang

JM3, Vol. 20, Issue 01, 013401, (March 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.013401

KEYWORDS: Metals, Lithography, Optical proximity correction, Standards development, Computer simulations, Logic, Transistors, System integration, Semiconductors, Semiconducting wafers

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Proceedings Article | 22 February 2021 Presentation + Paper

Source mask optimization based on design pattern library at 7nm technology node

Xiaojing Su, Lisong Dong, Yayi Wei, Tianyang Gai, Yajuan Su, Rui Chen

Proceedings Volume 11614, 116140P (2021) https://doi.org/10.1117/12.2584716

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Proceedings Article | 22 February 2021 Presentation + Paper

Multi-level layout hotspot detection based on multi-classification with deep learning

Tianyang Gai, Tong Qu, Xiaojing Su, Shuhan Wang, Lisong Dong, Libin Zhang, Rui Chen, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 11614, 116140W (2021) https://doi.org/10.1117/12.2583726

KEYWORDS: Data modeling, Neural networks, Sensors, Performance modeling, Optics manufacturing, Machine learning, Lithography, Convolutional neural networks, Yield improvement, Statistical modeling

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Proceedings Article | 20 September 2020 Poster + Paper

Analysis and mitigation of forbidden pitch effects for EUV lithography

Ling Ma, Lisong Dong, Taian Fan, Xiaojing Su, Jianfang He, Ruixuan Wu, Yumei Zhou, Yayi Wei

Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145

KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

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Proceedings Article | 20 September 2020 Presentation + Paper

Design rule optimization for via layers of multiple patterning solution at 7nm technology node

Xiaojing Su, Yayi Wei, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen

Proceedings Volume 11518, 115180O (2020) https://doi.org/10.1117/12.2573157

KEYWORDS: Optical lithography, Immersion lithography, Lithography, Photomasks, Source mask optimization, Manufacturing, Overlay metrology, Data processing, Standards development, Back end of line

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Proceedings Article | 23 March 2020 Presentation + Paper

Systematic DTCO flow for yield improvement at 14/12nm technology node

Xiaojing Su, Yayi Wei, Rui Chen, Yajuan Su, Lisong Dong, Joe Kwan, Recoo Zhang, Chunshan Du, Qijian Wan, Xinyi Hu

Proceedings Volume 11328, 113280L (2020) https://doi.org/10.1117/12.2551861

KEYWORDS: Lithography, Chemical mechanical planarization, Optical proximity correction, Design for manufacturing, Metals, Resolution enhancement technologies, Optical lithography, Silicon, Manufacturing, Etching

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Proceedings Article | 23 March 2020 Paper

Via optimization methodology for enhancing robustness of design at 14/12nm technology node

Xiaojing Su, Libin Zhang, Yayi Wei, Rui Chen, Yajuan Su, Lisong Dong, Chunshan Du, Qijian Wan, Xinyi Hu

Proceedings Volume 11328, 1132810 (2020) https://doi.org/10.1117/12.2551902

KEYWORDS: Metals, Optical proximity correction, Photovoltaics, Lithography, Double patterning technology, Optical lithography, Yield improvement, Microelectronics, Back end of line, Critical dimension metrology

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Proceedings Article | 26 September 2019 Paper

A fast DFM-driven standard cell qualification approach for critical layers of 14nm technology node

Xiaojing Su, Rui Chen, Yayi Wei, Yajuan Su, Lisong Dong

Proceedings Volume 11148, 1114818 (2019) https://doi.org/10.1117/12.2536626

KEYWORDS: Standards development, Optical proximity correction, Lithography, Manufacturing, Metals

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SPIE Journal Paper | 30 May 2019

Probability prediction model for bridging defects induced by combined influences from lithography and etch variations

Xiaojing Su, Dong Shen, Yayi Wei, Taian Fan, Lisong Dong, Libin Zhang, Yajuan Su, Rui Chen, Tianchun Ye

JM3, Vol. 18, Issue 02, 023503, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.023503

KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

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Proceedings Article | 20 March 2019 Paper

Design rule exploration for width sensitive zone for metal layers in advanced nodes

Xiaojing Su, Lisong Dong, Yayi Wei, Yajuan Su, Rui Chen, Chunshan Du

Proceedings Volume 10962, 1096212 (2019) https://doi.org/10.1117/12.2514783

KEYWORDS: Photomasks, Source mask optimization, Metals, Lithography, Etching, Semiconducting wafers, Electroluminescence, Molybdenum, Process modeling, Image classification

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Proceedings Article | 20 March 2019 Paper

SRAF rule extraction and insertion based on inverse lithography technology

Xiaojing Su, Pengzheng Gao, Yayi Wei, Weijie Shi

Proceedings Volume 10961, 109610P (2019) https://doi.org/10.1117/12.2511914

KEYWORDS: SRAF, Printing, Optical proximity correction, Lithography, Photomasks, Photovoltaics, Model-based design, Semiconducting wafers, Process modeling, Critical dimension metrology

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Proceedings Article | 20 March 2019 Paper

Sample patterns extraction from layout automatically based on hierarchical cluster algorithm for lithography process optimization

Tianyang Gai, Ying Chen, Pengzheng Gao, Xiaojing Su, Lisong Dong, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 10962, 109620X (2019) https://doi.org/10.1117/12.2514177

KEYWORDS: Feature extraction, Lithography, Optimization (mathematics), Photomasks, Optical proximity correction, Source mask optimization, Machine learning

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Proceedings Article | 3 October 2018 Paper

2D SRAF rule extraction for fast application based on model-based results

Yaoxuan Dai, Xiaojing Su, Pengzheng Gao, Yayi Wei, Yanrong Wang, Jing Zhang, Jiang Yan

Proceedings Volume 10810, 108101E (2018) https://doi.org/10.1117/12.2501455

KEYWORDS: SRAF, Model-based design, Microelectronics, Photomasks, Image classification, Extreme ultraviolet, Manufacturing, Roads, Extreme ultraviolet lithography

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Proceedings Article | 20 March 2018 Paper

Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development

Ying Chen, Tianyang Gai, Xiaojing Su, Yayi Wei, Yajuan Su, Tianchun Ye

Proceedings Volume 10588, 1058811 (2018) https://doi.org/10.1117/12.2296834

KEYWORDS: Lithography, Image processing, Double patterning technology, Computer simulations, Optics manufacturing, Microelectronics, New and emerging technologies, Image analysis, Data processing, Image quality

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SPIE Journal Paper | 24 August 2017

Optimization of the focus monitor mark in immersion lithography according to illumination type

Lisong Dong, Libin Zhang, Xiaojing Su, Jianfang He, Yayi Wei

JM3, Vol. 16, Issue 03, 033505, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033505

KEYWORDS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing

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Proceedings Article | 4 April 2017 Paper

Enhancing manufacturability of standard cells by using DTCO methodology

Lijun Zhao, Ying Chen, Xiaojing Su, Yajuan Su, Yayi Wei, Tianchun Ye

Proceedings Volume 10148, 101481G (2017) https://doi.org/10.1117/12.2263178

KEYWORDS: Lithography, Source mask optimization, Manufacturing, Optical lithography, Photomasks, 193nm lithography, Immersion lithography, Logic, Double patterning technology, Microelectronics, Metals

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Proceedings Article | 28 March 2017 Paper

New alignment mark design structures for higher diffraction order wafer quality enhancement

Libin Zhang, Yaobin Feng, Lisong Dong, Xiaojing Su, Zhengguo Tian, Chao Fang, Yayi Wei, Tianchun Ye

Proceedings Volume 10145, 101452C (2017) https://doi.org/10.1117/12.2257627

KEYWORDS: Optical alignment, Diffraction, Semiconducting wafers, Structural design, Overlay metrology, Optical design, Diffraction gratings, Interfaces, Process control, Manufacturing, Scanners, Oxides, Lithography, Absorption

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Proceedings Article | 28 March 2017 Paper

Hotspots fixing flow in NTD process by using DTCO methodology at 10nm metal 1 layer

Xiaojing Su, Lisong Dong, Jiaxin Lin, Ying Chen, Yayi Wei, Tianchun Ye, Chunshan Du, Feng Shao, Recco Zhang, Yu Zhu, Junjiang Lei, Minghui Fan

Proceedings Volume 10148, 1014817 (2017) https://doi.org/10.1117/12.2257786

KEYWORDS: Electroluminescence, Photovoltaics, Solar cells, Optimization (mathematics), Resolution enhancement technologies, Image processing, Molybdenum, Photomasks, Metals, Optical lithography, Lithography, Process modeling, Source mask optimization, Lead

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Proceedings Article | 24 March 2017 Paper

Improving the topography performance of ion implantation resist

Lisong Dong, Wenhui Chen, Xiaojing Su, Yayi Wei

Proceedings Volume 10147, 101471E (2017) https://doi.org/10.1117/12.2257776

KEYWORDS: Ion implantation, Lithography, Refractive index, Oxides, Optical lithography, Reflectivity, Silicon, Reflection, Metrology

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SPIE Journal Paper | 20 December 2016

Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node

Lisong Dong, Libin Zhang, Xiaojing Su, Zhiyang Song, Yayi Wei, Tianchun Ye

JM3, Vol. 15, Issue 04, 043509, (December 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043509

KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data

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Proceedings Article | 16 March 2016 Paper

Design technology co-optimization for 14/10nm metal1 double patterning layer

Yingli Duan, Xiaojing Su, Ying Chen, Yajuan Su, Feng Shao, Recco Zhang, Junjiang Lei, Yayi Wei

Proceedings Volume 9781, 97810X (2016) https://doi.org/10.1117/12.2218711

KEYWORDS: Manufacturing, Double patterning technology, Lithography, Analytical research, Algorithm development, Optical proximity correction, New and emerging technologies, Optical lithography, Optimization (mathematics), Immersion lithography, Source mask optimization, Design for manufacturing, Metals, Photomasks

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Proceedings Article | 8 March 2016 Paper

A novel mask structure for measuring the defocus of scanner

Lisong Dong, Zhiyang Song, Xiaojing Su, Yayi Wei

Proceedings Volume 9778, 97782A (2016) https://doi.org/10.1117/12.2218764

KEYWORDS: Photomasks, Diffraction, Scanners, Phase shifts, Lithography, Opacity, Diffraction gratings, Immersion lithography, Projection systems, Microelectronics

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Proceedings Article | 20 March 2015 Paper

Thickness optimization for lithography process on silicon substrate

Xiaojing Su, Yajuan Su, Yansong Liu, Fong Chen, Zhimin Liu, Wei Zhang, Bifeng Li, Tao Gao, Yayi Wei

Proceedings Volume 9425, 94251Z (2015) https://doi.org/10.1117/12.2085656

KEYWORDS: Reflectivity, Electroluminescence, Lithography, Refractive index, Etching, Critical dimension metrology, Silicon, Interfaces, Reflection, Photoresist processing

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Proceedings Article | 18 March 2015 Paper

Focus shift impacted by mask 3D and comparison between Att. PSM and OMOG

Yansong Liu, Xiaojing Su, LiSong Dong, Zhiyang Song, Moran Guo, Yajuan Su, Yayi Wei

Proceedings Volume 9426, 94261H (2015) https://doi.org/10.1117/12.2085659

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Phase shifts, Opacity, Source mask optimization, Critical dimension metrology, Electroluminescence, Nanoimprint lithography

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Showing 5 of 34 publications

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