Demonstration of proof of concept of the EUV-FEL for future lithography

Norio Nakamura; Ryokou Kato; Hiroshi Sakai; Kimichika Tsuchiya; Yasunori Tanimoto; Yosuke Honda; Tsukasa Miyajima; Miho Shimada; Takashi Obina; Hiroshi Kawata

doi:10.1117/12.2600782

30 September 2021 Demonstration of proof of concept of the EUV-FEL for future lithography

Norio Nakamura, Ryokou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, Hiroshi Kawata

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540M (2021) https://doi.org/10.1117/12.2600782
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

An ERL(energy recovery linac)-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic noise and to achieve higher throughput. An IR-FEL project started at the KEK cERL for the purpose of developing high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. We will briefly review the EUV-FEL and present construction and commissioning of the cERL IR-FEL including future work.

Conference Presentation

Citation Download Citation

Norio Nakamura, Ryokou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, and Hiroshi Kawata "Demonstration of proof of concept of the EUV-FEL for future lithography", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540M (30 September 2021); https://doi.org/10.1117/12.2600782

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