Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks

Bin Wang; Nathan Brooks; Michael Tanksalvala; Yuka Esashi; Nicolas Jenkins; Peter Johnsen; Iona Binnie; Guan Gui; YunZhe Shao; Margaret M. Murnane; Henry C. Kapteyn

doi:10.1117/12.2641726

1 December 2022 Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks

Bin Wang, Nathan Brooks, Michael Tanksalvala, Yuka Esashi, Nicolas Jenkins, Peter Johnsen, Iona Binnie, Guan Gui, YunZhe Shao, Margaret M. Murnane, Henry C. Kapteyn

Author Affiliations +

Proceedings Volume 12293, Photomask Technology 2022; 122930D (2022) https://doi.org/10.1117/12.2641726
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

As EUV lithography transitions to high volume manufacturing, actinic inspection tools at 13.5 nm wavelength are attractive for understanding the printability of EUV mask defects, as well as for in-fab monitoring for possible defects emerging from extended use. Coherent diffractive imaging (CDI) is a lensless imaging technique that allows for phaseand-amplitude, aberration-free, high-resolution imaging in the EUV. Moreover, sources based on high harmonic generation (HHG) of ultrafast lasers are a proven viable coherent light source for CDI, with flux sufficient for rapid large-area inspection and small-area imaging. By combining CDI and HHG, we implemented actinic EUV photomask inspection on a low-cost tabletop-scale setup. Moreover, we propose and demonstrate a solution to the challenge of ptychographic imaging of periodic structures through careful illumination engineering.

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Citation Download Citation

Bin Wang, Nathan Brooks, Michael Tanksalvala, Yuka Esashi, Nicolas Jenkins, Peter Johnsen, Iona Binnie, Guan Gui, YunZhe Shao, Margaret M. Murnane, and Henry C. Kapteyn "Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks", Proc. SPIE 12293, Photomask Technology 2022, 122930D (1 December 2022); https://doi.org/10.1117/12.2641726

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