Mr. Nicholas W. Jenkins Profile

Nicholas W. Jenkins

at JILA

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Author

Publications (7)

Proceedings Article | 10 April 2024 Presentation + Paper

EUV scatterometry: low-dose characterization of polymer-based metamaterials

Nicholas Jenkins, Yuka Esashi, Yunzhe Shao, Michael Tanksalvala, Henry Kapteyn, Margaret Murnane, Matthew Atkinson

Proceedings Volume 12955, 1295513 (2024) https://doi.org/10.1117/12.3009911

KEYWORDS: Extreme ultraviolet, Polymers, Diffraction, Scatterometry, Reflectometry, Metamaterials, Scanning transmission electron microscopy, Biological samples, Charge-coupled devices, Statistical modeling

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Proceedings Article | 30 April 2023 Presentation

High-fidelity actinic ptychographic imaging of EUV photomasks enabled by illumination engineering

Bin Wang, Nathan Brooks, Iona Binnie, Michael Tanksalvala, Yuka Esashi, Nicholas Jenkins, Margaret Murnane, Henry Kapteyn

Proceedings Volume 12496, 124960A (2023) https://doi.org/10.1117/12.2670528

KEYWORDS: Metrology, Light sources, Extreme ultraviolet, Photomasks, Illumination engineering, Diffraction, Signal processing, Phase shift keying, Light sources and illumination, Beam divergence

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Proceedings Article | 27 April 2023 Presentation + Paper

Multi-modal tabletop EUV reflectometry for characterization of nanostructures

Yuka Esashi, Nicholas Jenkins, Michael Tanksalvala, Yunzhe Shao, Brendan McBennett, Joshua Knobloch, Henry Kapteyn, Margaret Murnane

Proceedings Volume 12496, 1249614 (2023) https://doi.org/10.1117/12.2658543

KEYWORDS: Reflectometry, Extreme ultraviolet, Nanostructures, Diffraction, Surface roughness, Metrology, Phase retrieval, High harmonic generation, Chemical composition

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Proceedings Article | 1 December 2022 Presentation + Paper

Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks

Bin Wang, Nathan Brooks, Michael Tanksalvala, Yuka Esashi, Nicolas Jenkins, Peter Johnsen, Iona Binnie, Guan Gui, YunZhe Shao, Margaret Murnane, Henry Kapteyn

Proceedings Volume 12293, 122930D (2022) https://doi.org/10.1117/12.2641726

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Imaging systems, Microscopes, High harmonic generation, Phase retrieval, Reticles

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Proceedings Article | 13 June 2022 Presentation

Towards shot-noise-limited EUV reflectometry: in a tabletop coherent EUV microscope

Nicholas Jenkins, Michael Tanksalvala, Yuka Esashi, Henry Kapteyn, Margaret Murnane

Proceedings Volume PC12053, PC1205306 (2022) https://doi.org/10.1117/12.2612098

KEYWORDS: Reflectometry, Extreme ultraviolet, Beam splitters, Tolerancing, Silicon, Semiconductors, Metrology, Cameras, CCD image sensors, CCD cameras

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Proceedings Article | 22 February 2021 Presentation + Paper

A new metrology technique for defect inspection via coherent Fourier scatterometry using orbital angular momentum beams

Bin Wang, Michael Tanksalvala, Zhe Zhang, Yuka Esashi, Nicholas Jenkins, Margaret Murnane, Henry Kapteyn, Chen-Ting Liao

Proceedings Volume 11611, 116110L (2021) https://doi.org/10.1117/12.2584728

KEYWORDS: Scatterometry, Defect inspection, Metrology, Model-based design, Defect detection, Cameras, Signal to noise ratio, Sensors, Extreme ultraviolet, X-rays

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Proceedings Article | 26 March 2019 Presentation

Variable-wavelength tabletop-scale EUV ptychographic complex imaging reflectometry for 3D composition determination (Conference Presentation)

Michael Tanksalvala, Christina Porter, Yuka Esashi, Galen Miley, Robert Karl, Peter Johnsen, Nicholas Jenkins, Charles Bevis, Bin Wang, Jeremy Thurston, Xiaoshi Zhang, Seth Cousin, Daniel Adams, Michael Gerrity, Henry Kapteyn, Margaret Murnane.

Proceedings Volume 10959, 109590G (2019) https://doi.org/10.1117/12.2516827

KEYWORDS: Extreme ultraviolet, Stereoscopy, Reflectometry, 3D image processing

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Showing 5 of 7 publications

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