Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng; Gregory S. Doerk; Charles T. Rettner; Gurpreet Singh; Melia Tjio; Hoa Truong; Noel Arellano; Srinivasan Balakrishnan; Markus Brink; Hsinyu Tsai; Chi-Chun Liu; Michael A. Guillorn; Daniel P. Sanders

doi:10.1117/12.2086973

19 March 2015 Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory S. Doerk, Charles T. Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael A. Guillorn, Daniel P. Sanders

Author Affiliations +

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 942307 (2015) https://doi.org/10.1117/12.2086973
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Diminishing error tolerance renders the customization of patterns created through directed self-assembly (DSA) extremely challenging at tighter pitch. A self-aligned customization scheme can be achieved using a hybrid prepattern comprising both organic and inorganic regions that serves as a guiding prepattern to direct the self-assembly of the block copolymers as well as a cut mask pattern for the DSA arrays aligned to it. In this paper, chemoepitaxy-based self-aligned customization is demonstrated using two types of organic-inorganic prepatterns. CHEETAH prepattern for “CHemoepitaxy Etch Trim using a self-Aligned Hardmask” of preferential hydrogen silsesquioxane (HSQ, inorganic resist), non-preferential organic underlayer is fabricated using electron beam lithography. Customized trench or hole arrays can be achieved through co-transfer of DSA-formed arrays and CHEETAH prepattern. Herein, we also introduce a tone-reversed version called reverse-CHEETAH (or rCHEETAH) in which customized line segments can be achieved through co-transfer of DSA-formed arrays formed on a prepattern wherein the inorganic HSQ regions are nonpreferential and the organic regions are PMMA preferential. Examples of two-dimensional self-aligned customization including 25nm pitch fin structures and an 8-bar “IBM” illustrate the versatility of this customization scheme using rCHEETAH.

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Joy Cheng, Gregory S. Doerk, Charles T. Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael A. Guillorn, and Daniel P. Sanders "Customization and design of directed self-assembly using hybrid prepatterns", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942307 (19 March 2015); https://doi.org/10.1117/12.2086973

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