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Ayako Nakajima
at Osaka Univ
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Author
Publications (4)
Proceedings Article | 26 September 2019 Paper
Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer
Proceedings Volume 11148, 1114814 (2019) https://doi.org/10.1117/12.2536526
KEYWORDS: Fluorine, Chemical species, Scanning electron microscopy, Lithography, Optical lithography, Absorption, Carbon
Proceedings Article | 28 June 2019 Paper
Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism
Proceedings Volume 10957, 109570C (2019) https://doi.org/10.1117/12.2515133
KEYWORDS: Nanoparticles, Line width roughness, Metals, Oxides, X-rays, Reflectivity, Extreme ultraviolet, Zirconium dioxide, Extreme ultraviolet lithography
Proceedings Article | 31 May 2019 Paper
Fundamental study on dissolution kinetics of poly(4-hydroxystyrene) for development of high-resolution resists
Proceedings Volume 10957, 109571R (2019) https://doi.org/10.1117/12.2514938
KEYWORDS: Polymers, Molecules, Quartz, Crystals, Polymer thin films, Extreme ultraviolet lithography, Diffusion, Complex systems, Chemically amplified resists, Lithography
Proceedings Article | 3 October 2018 Presentation + Paper
Material design for the improvement of ZEP520A performance
Proceedings Volume 10810, 108100O (2018) https://doi.org/10.1117/12.2501648
KEYWORDS: Polymers, Electron beam lithography, Molecules, Scanning electron microscopy, Silicon, Semiconducting wafers, Lithography, Nanolithography, Nanoimprint lithography, Polymethylmethacrylate
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