Mr. Yoshitaka Komuro Profile

Yoshitaka Komuro

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 9 April 2024 Presentation + Paper

Substituent effects of acid generators on radiation-induced degradation and dissolution kinetics in chemically amplified resist process

Yoshika Tsuda, Yusa Muroya, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro

Proceedings Volume 12957, 1295708 (2024) https://doi.org/10.1117/12.3008970

KEYWORDS: Electrons, Absorbance, Sampling rates, Chemically amplified resists, Pulse generators, Stochastic processes, Quartz, Polymers, Photoresist processing, Photons

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Proceedings Article | 25 May 2022 Presentation + Paper

State of polymer chains in alkaline developer studied by dynamic light scattering

Naoki Tanaka, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Proceedings Volume 12055, 120550J (2022) https://doi.org/10.1117/12.2614138

KEYWORDS: Polymer thin films, Dynamic light scattering

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Analysis of dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution using machine learning

Naoki Tanaka, Kyoko Watanabe, Kyoko Matsuoka, Kazuki Azumagawa, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Proceedings Volume 11612, 116120R (2021) https://doi.org/10.1117/12.2584067

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Proceedings Article | 20 September 2020 Presentation

Study on dependence of transient swelling layer formation on molecular weight and dispersion of backbone polymer of chemically amplified EUV resists

Takahiro Kozawa, Kyoko Watanabe, Kyoko Matsuoka, Naoki Tanaka, Kazuki Azumagawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana

Proceedings Volume 11517, 115170G (2020) https://doi.org/10.1117/12.2574877

KEYWORDS: Polymers, Stochastic processes, Dispersion, Extreme ultraviolet, Line edge roughness, Molecules, Photons, Bridges, Chemical reactions, Diffusion

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Proceedings Article | 31 May 2019 Paper

Fundamental study on dissolution kinetics of poly(4-hydroxystyrene) for development of high-resolution resists

Ayako Nakajima, Kyoko Watanabe, Kyoko Matsuoka, Takahiro Kozawa, Yoshitaka Komuro, Daisuke Kawana, Akiyoshi Yamazaki

Proceedings Volume 10957, 109571R (2019) https://doi.org/10.1117/12.2514938

KEYWORDS: Polymers, Molecules, Quartz, Crystals, Polymer thin films, Extreme ultraviolet lithography, Diffusion, Complex systems, Chemically amplified resists, Lithography

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Proceedings Article | 18 March 2016 Paper

Patterning performance of chemically amplified resist in EUV lithography

Tatsuya Fujii, Shogo Matsumaru, Tomotaka Yamada, Yoshitaka Komuro, Daisuke Kawana, Katsumi Ohmori

Proceedings Volume 9776, 97760Y (2016) https://doi.org/10.1117/12.2218417

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Lithography, Diffusion, Extreme ultraviolet, Polymers, Chemically amplified resists, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Quantum efficiency, Electrons, Semiconducting wafers

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Proceedings Article | 20 March 2015 Paper

Development of EUV chemically amplified resist which has novel protecting group

Shogo Matsumaru, Tatsuya Fujii, Takashi Kamizono, Kenta Suzuki, Hiroto Yamazaki, Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue, Daisuke Kawana, Taku Hirayama, Katsumi Ohmori

Proceedings Volume 9425, 94250U (2015) https://doi.org/10.1117/12.2087197

KEYWORDS: Polymers, Extreme ultraviolet, Quantum efficiency, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Chemically amplified resists, High volume manufacturing, Polymer thin films, Diffusion

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Proceedings Article | 20 March 2015 Paper

Block co-polymer approach for CD uniformity and placement error improvement in DSA hole grapho-epitaxy process

Tasuku Matsumiya, Tsuyoshi Kurosawa, Masahito Yahagi, Hitoshi Yamano, Ken Miyagi, Takaya Maehashi, Issei Suzuki, Akiya Kawaue, Yoshitaka Komuro, Taku Hirayama, Katsumi Ohmori

Proceedings Volume 9425, 942517 (2015) https://doi.org/10.1117/12.2087009

KEYWORDS: Materials processing, Coating, Annealing, Error analysis, Critical dimension metrology, Optical lithography, Polymers, Image processing, Manufacturing, Directed self assembly

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Proceedings Article | 13 March 2015 Paper

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Kazuo Kobayashi, Katsumi Ohomori, Takahiro Kozawa

Proceedings Volume 9422, 94220O (2015) https://doi.org/10.1117/12.2085749

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Double positive medium, Chemically amplified resists, Quantum efficiency, Lithography, Diffusion, Line width roughness, Ionization

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Proceedings Article | 17 April 2014 Paper

Electron and hole transfer in anion-bound chemically amplified resists used in extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Yoshiyuki Utsumi, Katsumi Ohmori, Takahiro Kozawa

Proceedings Volume 9048, 90481F (2014) https://doi.org/10.1117/12.2046627

KEYWORDS: Polymers, Chemically amplified resists, Extreme ultraviolet lithography, Absorption, Diffusion, Extreme ultraviolet, Ionization, Line edge roughness, Electron beams, Matrices

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Proceedings Article | 1 April 2009 Paper

A study of the photo acid generator material design for chemically amplified photoresists

Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, Hideo Hada, J. Onodera

Proceedings Volume 7273, 72732F (2009) https://doi.org/10.1117/12.815190

KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

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Showing 5 of 11 publications

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