Booky Lee
Deputy Plant Manager at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 15 May 2007 Paper
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6607, 660736 (2007) https://doi.org/10.1117/12.729025
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics

Proceedings Article | 20 October 2006 Paper
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6349, 634954 (2006) https://doi.org/10.1117/12.692881
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics

Proceedings Article | 20 May 2006 Paper
Orson Lin, Jomarch Chou, K. K. Fu, Booky Lee, Richard Lu, Jerry Lu, Chiang-Lin Shi
Proceedings Volume 6283, 62831S (2006) https://doi.org/10.1117/12.681754
KEYWORDS: Etching, Photomasks, Chromium, Resolution enhancement technologies, Neodymium, Quartz, Image processing, Diffractive optical elements, Phase shifts, Binary data

Proceedings Article | 21 March 2006 Paper
Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang
Proceedings Volume 6154, 615414 (2006) https://doi.org/10.1117/12.656827
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, Scanning electron microscopy, Calibration, Image quality, Semiconducting wafers, Image processing, Semiconductors

Proceedings Article | 8 November 2005 Paper
Gordon Chan, Orson Lin, Wesen Tseng, Booky Lee, Torey Huang, Makoto Kozuma
Proceedings Volume 5992, 59923B (2005) https://doi.org/10.1117/12.632052
KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics

Showing 5 of 8 publications
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