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Chienkang Chen
Director at Lim Chemical Co Ltd
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Publications (1)
Proceedings Article | 4 October 2016 Paper
The CD control improvement by using CDSEM 2D measurement of complex OPC patterns
William Chou, Jeffrey Cheng, Adder Lee, James Cheng, Alex Tzeng, Colbert Lu, Ray Yang, Hong Jen Lee, Hideaki Bandoh, Izumi Santo, Hao Zhang, Chien Kang Chen
Proceedings Volume 9985, 99851M (2016) https://doi.org/10.1117/12.2241326
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Holons, Lithography, Edge roughness, Source mask optimization
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