CONFERENCE PROCEEDINGS
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Christian Krauss
at HamaTech AG
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 6 May 2005 Paper
E-beam direct-write lithography for the 45nm node using the novel STEAG HamaTech single substrate coat-bake-develop ModuTrack
L. Berger, W. Dieckmann, C. Krauss, P. Dress, J. Waldorf, C. Y. Cheng, S. L. Wei, W. S. Chen, M. J. Kao, M. J. Tsai
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596484
KEYWORDS: Coating, Semiconducting wafers, Photomasks, Electron beam direct write lithography, Standards development, Direct write lithography, Lithography, Calibration, Field programmable gate arrays, Head-mounted displays
Proceedings Article | 17 December 2003 Paper
90-nm mask making processes using the positive tone chemically amplified resist FEP171
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518043
KEYWORDS: Opacity, Mask making, Electron beam lithography, Photoresist processing, Etching, Chemically amplified resists, Optical proximity correction, Line edge roughness, Photomasks, Scattering
Proceedings Article | 27 December 2002 Paper
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Corinna Koepernik, Dirk Beyer, Peter Dress, Thomas Hoffmann, Peter Hudek, Mathias Irmscher, Christian Krauss, Bernd Leibold, Dietmar Mueller, Christian Reuter, Reinhard Springer, Jakob Szekeresch, Peter Voehringer
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467424
KEYWORDS: Coating, Photoresist processing, Mask making, Chemically amplified resists, Photomasks, Electron beam lithography, Capillaries, Binary data, Critical dimension metrology, Etching
Proceedings Article | 27 December 2002 Paper
STEAG HamaTech resist coater ASR5000: tool concept and process results
Christian Krauss, Uwe Dietze, Fei Xu, Corinna Koepernik, Peter Dress, Peter Voehringer, Mathias Irmscher, Jakob Szekeresch
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467509
KEYWORDS: Thin film coatings, Photomasks, Photoresist processing, Capillaries, Liquids, Temperature metrology, Particles, Patents, Control systems, Solids
Proceedings Article | 1 August 2002 Paper
Comparative evaluation of e-beam sensitive chemically amplified resists for mask making
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Chris Constantine, Thomas Hoffmann, Corinna Koepernik, Christian Krauss, Bernd Leibold, Florian Letzkus, Dietmar Mueller, Reinhard Springer, Peter Voehringer
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476944
KEYWORDS: Photomasks, Semiconducting wafers, Mask making, Line edge roughness, Etching, Silicon, Coating, Chemically amplified resists, Photoresist processing, Chromium
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