Dr. Christopher J. Evans Profile

Dr. Christopher J. Evans

Senior Scientist at Univ of North Carolina at Charlotte

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 20 August 2020 Presentation + Paper

Error sources, compensation, and probe path optimization for on-machine metrology of freeform optics

Laura Hopper, Todd Noste, Jimmie Miller, Chris Evans

Proceedings Volume 11487, 1148709 (2020) https://doi.org/10.1117/12.2568797

KEYWORDS: Metrology, Data acquisition, Time metrology, Sensors, Motion measurement, Mathematical modeling, LabVIEW, Freeform optics, Body temperature, Temperature metrology

Read Abstract +

Proceedings Article | 14 May 2019 Presentation + Paper

Concurrent engineering of a next-generation freeform telescope: metrology and test

Todd Noste, Chris Evans, Jimmie Miller, Laura Hopper

Proceedings Volume 10998, 109980Y (2019) https://doi.org/10.1117/12.2519162

KEYWORDS: Optics manufacturing, Metrology, Mirrors, Freeform optics, Manufacturing, Monte Carlo methods, Mathematical modeling, Telescopes, Error analysis, Nanotechnology

Read Abstract +

Proceedings Article | 23 August 2017 Presentation + Paper

Application of instrument transfer function to a fringe projection system for measuring rough surfaces

Bin Zhang, Angela Davies, John Ziegert, Christopher Evans

Proceedings Volume 10373, 103730S (2017) https://doi.org/10.1117/12.2275892

KEYWORDS: Additive manufacturing, Projection systems, Metrology, Metals, Laser manufacturing, Laser welding, Inspection, Interferometry, In situ metrology

Read Abstract +

Proceedings Article | 23 August 2017 Presentation + Paper

Usefulness of orthogonal basis sets for predicting optical performance of wavefronts with mid-spatial frequency error

Zahra Hosseinimakarem, Angela Davies, Chris Evans

Proceedings Volume 10373, 1037302 (2017) https://doi.org/10.1117/12.2275831

KEYWORDS: Wavefronts, Zernike polynomials, Modulation transfer functions, Freeform optics, Optical components, Optical design, Scattering

Read Abstract +

Proceedings Article | 23 August 2017 Presentation + Paper

Phase measuring deflectometry for determining 5 DOF misalignment of segmented mirrors

Angela Davies, Trent Vann, Christopher Evans, Mark Butkiewicz

Proceedings Volume 10373, 103730H (2017) https://doi.org/10.1117/12.2276947

KEYWORDS: Deflectometry, Segmented mirrors, Mirrors, Cameras, Optical alignment, Metrology, Telescopes, Interferometry, Fringe analysis, Moire patterns

Read Abstract +

Proceedings Article | 26 September 2016 Paper

Zernike polynomials for mid-spatial frequency representation on optical surfaces

Zahra Hosseinimakarem, Angela Davies, Chris Evans

Proceedings Volume 9961, 99610P (2016) https://doi.org/10.1117/12.2236520

KEYWORDS: Zernike polynomials, Fabrication, Freeform optics, Received signal strength, Raster graphics, Optical spheres, Germanium, Polishing, Spatial frequencies, Superposition

Read Abstract +

Proceedings Article | 18 August 2014 Paper

Spurious mid-spatial frequency structure on optical surfaces reconstructed from surface slope measurements

Yue Dong, Zahra Hosseinimakarem, Angela Davies, Chris Evans

Proceedings Volume 9203, 92030G (2014) https://doi.org/10.1117/12.2061247

KEYWORDS: Reconstruction algorithms, Spatial frequencies, Surface finishing, Metrology, Freeform optics, Wavefronts, Error analysis, Polishing, Image quality, Adaptive optics

Read Abstract +

Proceedings Article | 13 September 2012 Paper

Comparison of the area structure function to alternate approaches for optical surface characterization

Liangyu He, Angela Davies, Chris Evans

Proceedings Volume 8493, 84930C (2012) https://doi.org/10.1117/12.929166

KEYWORDS: Spatial frequencies, Anisotropy, Surface finishing, Metrology, Visualization, Image processing, Mechanical engineering, Astronomy, Surface roughness, Optics manufacturing

Read Abstract +

Proceedings Article | 11 October 2010 Paper

Certification, self-calibration, and uncertainty in testing optical flats

Chris Evans

Proceedings Volume 7656, 76560S (2010) https://doi.org/10.1117/12.865762

KEYWORDS: Calibration, Optical testing, Metrology, Standards development, Optical calibration, Photovoltaics, Interferometry, Fizeau interferometers, Nanolithography, Optics manufacturing

Read Abstract +

SPIE Journal Paper | 1 April 2009

PVr-a robust amplitude parameter for optical surface specification

Christopher Evans

OE, Vol. 48, Issue 04, 043605, (April 2009) https://doi.org/10.1117/12.10.1117/1.3119307

KEYWORDS: Photovoltaics, Optics manufacturing, Interferometers, Sensors, Spatial resolution, Optical engineering, Optical filters, Zernike polynomials, Imaging systems, Diffraction

Read Abstract +

Proceedings Article | 1 September 2005 Paper

High performance Fizeau and scanning white-light interferometers for mid-spatial frequency optical testing of free-form optics

Leslie Deck, Chris Evans

Proceedings Volume 5921, 59210A (2005) https://doi.org/10.1117/12.616874

KEYWORDS: Spatial frequencies, Microscopes, Interferometers, Interferometry, Fizeau interferometers, Objectives, Turbulence, Charge-coupled devices, Distortion, Optical testing

Read Abstract +

Proceedings Article | 3 November 2003 Paper

Application of precision diamond machining to the manufacture of microphotonics components

Matthew Davies, Christopher Evans, Rashmi Vohra, Brent Bergner, Steven Patterson

Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.506373

KEYWORDS: Diamond, Diamond machining, Manufacturing, Diamond turning, Micro optics, Nickel, Crystals, Optics manufacturing, Lithography, Electronics

Read Abstract +

Proceedings Article | 27 December 2001 Paper

Uncertainties in interferometric measurements of radius of curvature

Tony Schmitz, Angela Davies, Christopher Evans

Proceedings Volume 4451, (2001) https://doi.org/10.1117/12.453641

KEYWORDS: Optical spheres, Confocal microscopy, Eye, Wavefronts, Interferometers, Environmental sensing, Zerodur, Spherical lenses, Interferometry, Uncertainty analysis

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Interferometric testing of photomask substrate flatness

Christopher Evans, Robert Parks, Lianzhen Shao, Tony Schmitz, Angela Davies

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436725

KEYWORDS: Photomasks, Optical spheres, Interferometers, Reflection, Interferometry, Reflectivity, Wavefronts, Visibility, Spherical lenses, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Haidinger interferometer for silicon wafer TTV measurement

Robert Parks, Lianzhen Shao, Angela Davies, Christopher Evans

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436775

KEYWORDS: Semiconducting wafers, Silicon, Interferometers, Wavefronts, Wafer-level optics, Optical spheres, Sensors, Semiconductor lasers, Phase shifting, Interferometry

Read Abstract +

Proceedings Article | 18 June 2001 Paper

Interferometric figure metrology: enabling in-house traceability

Christopher Evans, Angela Davies, Tony Schmitz, Robert Parks

Proceedings Volume 4450, (2001) https://doi.org/10.1117/12.431256

KEYWORDS: Optical testing, Wavefronts, Interferometers, Metrology, Calibration, Optics manufacturing, Semiconducting wafers, Uncertainty analysis, Interferometry, Signal to noise ratio

Read Abstract +

Proceedings Article | 30 October 1998 Paper

NIST virtual/physical random-profile roughness calibration standards

Jun-Feng Song, Christopher Evans, M. McGlauflin, E. Whitenton, Theodore Vorburger, Y. Yuan

Proceedings Volume 3426, (1998) https://doi.org/10.1117/12.328457

KEYWORDS: Standards development, Calibration, Manufacturing, Radium, Prototyping, Distortion, Surface roughness, Diamond turning, Process control, Sensing systems

Read Abstract +

SPIE Journal Paper | 1 June 1998

Comment on the paper "Interferometric testing of optical surfaces: absolute measurements of flatness"

Christopher Evans

OE, Vol. 37, Issue 06, (June 1998) https://doi.org/10.1117/12.10.1117/1.601704

KEYWORDS: Optical testing, Interferometry

Proceedings Article | 1 November 1997 Paper

Applications of the rapidly renewable lap

Robert Parks, Christopher Evans, David Roderick, John Dagata

Proceedings Volume 3134, (1997) https://doi.org/10.1117/12.295130

KEYWORDS: Polishing, Diamond, Surface finishing, Silicon, Silicon carbide, Glasses, Silicon films, Foam, Aluminum, Iron

Read Abstract +

Proceedings Article | 1 November 1997 Paper

Measurements of the LIGO Pathfinder optics

Robert Parks, Christopher Evans, Paul Sullivan, Lianzhen Shao, Bryan Loucks

Proceedings Volume 3134, (1997) https://doi.org/10.1117/12.295122

KEYWORDS: Mirrors, Interferometers, LIGO, Optical testing, Monochromatic aberrations, Wavefronts, Safety, Error analysis, Computer programming, Zernike polynomials

Read Abstract +

Proceedings Article | 1 November 1997 Paper

Using advanced diagnostics to detect subsurface damage in sapphire

David Black, Linda Braun, Harold Burdette, Christopher Evans, Bernard Hockey, Robert Polvani, Grady White

Proceedings Volume 3134, (1997) https://doi.org/10.1117/12.295133

KEYWORDS: Sapphire, Annealing, Surface finishing, Crystals, Diagnostics, X-ray diffraction, X-rays, Raman spectroscopy, Transmission electron microscopy, Polishing

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Method to characterize overlay tool misalignments and distortions

Richard Silver, James Potzick, Fredric Scire, Christopher Evans, M. McGlauflin, Edward Kornegay, Robert Larrabee

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275965

KEYWORDS: Overlay metrology, Error analysis, Motion measurement, Optics manufacturing, Calibration, Diamond turning, Data acquisition, Optical alignment, Confocal microscopy, Photometry

Read Abstract +

Proceedings Article | 8 September 1995 Paper

Rapidly renewable polishing lap

Christopher Evans, Robert Parks

Proceedings Volume 2536, (1995) https://doi.org/10.1117/12.218429

KEYWORDS: Polishing, Foam, Diamond, Ceramics, Polymers, Polymer thin films, Surface finishing, Abrasives, Sapphire, Aluminum

Read Abstract +

Proceedings Article | 1 January 1992 Paper

Upgraded facility for multilayer mirror characterization at NIST

Richard Watts, David Ederer, Richard Deslattes, Thomas Lucatorto, William Estler, Christopher Evans, Theodore Vorburger

Proceedings Volume 1547, (1992) https://doi.org/10.1117/12.51284

KEYWORDS: Reflectometry, Extreme ultraviolet, Mirrors, X-rays, Monochromators, Reflectivity, Sensors, X-ray optics, Optical design, Optics manufacturing

Read Abstract +