Dr. Dongqing Zhang Profile

Dr. Dongqing Zhang

at Shanghai Institute of Optics and Fine Mechanic

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 19 May 2006 Paper

Coma aberration measurement by lateral image displacements at different defocus positions

Mingying Ma, Xiangzhao Wang, Fan Wang, Weijie Shi, Dongqing Zhang

Proceedings Volume 6150, 615003 (2006) https://doi.org/10.1117/12.676894

KEYWORDS: Monochromatic aberrations, Projection systems, Lithography, Optical lithography, Coherence (optics), Semiconducting wafers, Fluctuations and noise, Optical alignment, Ray tracing, Optical testing

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SPIE Journal Paper | 1 May 2006

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Osami Sasaki

OE, Vol. 45, Issue 05, 053201, (May 2006) https://doi.org/10.1117/12.10.1117/1.2202917

KEYWORDS: Adaptive optics, Optical alignment, Projection systems, Lithography, Semiconducting wafers, Imaging systems, Image quality, Distortion, Monochromatic aberrations, Optical engineering

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Proceedings Article | 27 January 2005 Paper

A new method to determine the energy range for the FOCAL technique

Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang, Liping Guo, Jianming Hu, Mingying Ma, Le He

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573815

KEYWORDS: Adaptive optics, Image quality, Semiconducting wafers, Optical alignment, Lithography, Calibration, Monochromatic aberrations, Line width roughness, Photoresist processing, Optical lithography

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Proceedings Article | 27 January 2005 Paper

Coma measurement by transmission image sensor with a PSM

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, Jianming Hu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573642

KEYWORDS: Monochromatic aberrations, Binary data, Photomasks, Phase shifting, Image sensors, Diffraction, Coherence (optics), Wavefronts, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 27 January 2005 Paper

Exposure dose control for step-and-scan lithography

Liping Guo, Huijie Huang, Xiangzhao Wang, Dongqing Zhang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.567919

KEYWORDS: Lithography, Control systems, Semiconducting wafers, Excimer lasers, Sensors, Pulsed laser operation, Time metrology, Calibration, Reticles, Critical dimension metrology

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Proceedings Article | 27 January 2005 Paper

Application of BP-neural networks in the FOCAL technique

Weijie Shi, Xiangzhao Wang, Dongqing Zhang, Fan Wang, Mingying Ma

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573822

KEYWORDS: Neural networks, Neurons, Monochromatic aberrations, Optical alignment, Semiconducting wafers, Lithography, Artificial neural networks, Evolutionary algorithms, Adaptive optics, Imaging systems

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Proceedings Article | 8 December 2004 Paper

Absorption measurement for coatings using surface thermal lensing technique

Shuhai Fan, Hongbo He, Jianda Shao, Zhengxiu Fan, Dongqing Zhang

Proceedings Volume 5774, (2004) https://doi.org/10.1117/12.607475

KEYWORDS: Absorption, Laser beam diagnostics, Optical filters, Absorption filters, Dielectric filters, Optical coatings, Thermography, Power meters, Amplifiers, Electronic filtering

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Showing 5 of 7 publications

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