Dr. Jianming Hu Profile

Dr. Jianming Hu

at Chongqing Normal Univ

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Author

Publications (6)

Proceedings Article | 8 February 2012 Paper

Visible light optical coherence tomography for in vivo imaging the spectral contrasts of the retinal nerve fiber layer

Xiangyang Zhang, Jianming Hu, Robert Knighton, Xiang-Run Huang, Carmen Puliafito, Shuliang Jiao

Proceedings Volume 8213, 82130H (2012) https://doi.org/10.1117/12.909525

KEYWORDS: Optical coherence tomography, Near infrared, Imaging systems, Eye, Visible radiation, Reflectivity, Nerve, Retina, In vivo imaging, Sapphire lasers

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Proceedings Article | 9 February 2009 Paper

Study on gradient index micro-cylinder lens with gradual focus

Jianming Hu, Shouyue Wu, Yu Zhang, Yiping Liang, Teli Dai

Proceedings Volume 7158, 715803 (2009) https://doi.org/10.1117/12.811895

KEYWORDS: Fiber lasers, GRIN lenses, Refractive index, Laser applications, Ion exchange, Lithography, Glasses, Semiconductor lasers, Laser development, Structured optical fibers

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Proceedings Article | 9 February 2009 Paper

The orthogonal gradient index micro-cylinder lens arrays used for LD beam shaping

Shouyue Wu, Jianming Hu, Xiaoping Jiang, Desen Liu

Proceedings Volume 7158, 715805 (2009) https://doi.org/10.1117/12.811901

KEYWORDS: Beam shaping, GRIN lenses, Semiconductor lasers, Glasses, Refractive index, Matrices, Lens design, Gradient-index optics, Beam propagation method, Optical components

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Proceedings Article | 19 May 2006 Paper

Method for measuring the granite surface topography of wafer stage with laser interferometer

Le He, Xiangzhao Wang, Weijie Shi, Jianming Hu

Proceedings Volume 6150, 615008 (2006) https://doi.org/10.1117/12.676906

KEYWORDS: Semiconducting wafers, Interferometers, Lithography, Time metrology, Wafer-level optics, Optical lithography, Optical testing, Tolerancing, Interferometry, Metrology

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Proceedings Article | 27 January 2005 Paper

Coma measurement by transmission image sensor with a PSM

Fan Wang, Xiangzhao Wang, Mingying Ma, Dongqing Zhang, Weijie Shi, Jianming Hu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573642

KEYWORDS: Monochromatic aberrations, Binary data, Photomasks, Phase shifting, Image sensors, Diffraction, Coherence (optics), Wavefronts, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 27 January 2005 Paper

A new method to determine the energy range for the FOCAL technique

Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang, Liping Guo, Jianming Hu, Mingying Ma, Le He

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573815

KEYWORDS: Adaptive optics, Image quality, Semiconducting wafers, Optical alignment, Lithography, Calibration, Monochromatic aberrations, Line width roughness, Photoresist processing, Optical lithography

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Showing 5 of 6 publications

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