CONFERENCE PROCEEDINGS
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Feng Tian
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Author
Publications (4)
Proceedings Article | 26 May 2022 Presentation + Paper
A novel methodology for wafer-level scanner focus spot capture and back-tracing mechanism
Jin Zhu, Chieh-Chen Chiu, Kevin Huang, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Dan Li, Shengyuan Zhong, Aijiao Zhu, Ningqi Zhu, Yunchen Xu, Jincheng Pei
Proceedings Volume 12053, 120530U (2022) https://doi.org/10.1117/12.2627284
KEYWORDS: Semiconducting wafers, Contamination, Scanners, Data processing, Statistical analysis, Detection and tracking algorithms, Optical lithography, Lithography, Data analysis
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A new development algorithm to optimize scanner alignment sampling for cross-chuck overlay performance optimization
Chieh-Chen Chiu, Jin Zhu, Kevin Huang, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Chao-Jen Tsou, Shengyuan Zhong, Norman Birnstein, Robin Maximilian Zech, Clemens Utzny, Jincheng Pei
Proceedings Volume 12053, 1205329 (2022) https://doi.org/10.1117/12.2627283
KEYWORDS: Optical alignment, Optimization (mathematics), Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Performance modeling, Semiconductors
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A comprehensive study of scanner alignment mark quantity and layout-dependent effect for overlay performance optimization
Proceedings Volume 12053, 1205319 (2022) https://doi.org/10.1117/12.2614375
KEYWORDS: Optical alignment, Semiconducting wafers, Scanners, Overlay metrology, Optimization (mathematics), Computer simulations, Performance modeling, Device simulation, Data modeling
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Overcome machine to machine overlay for better scanner mix-run control
Kevin Huang, Chieh-Chen Chiu, Jin Zhu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Aijiao Zhu, Ningqi Zhu, Dan Li, Jincheng Pei
Proceedings Volume 12053, 1205318 (2022) https://doi.org/10.1117/12.2614372
KEYWORDS: Scanners, Optical parametric oscillators, Semiconducting wafers, Reticles, Performance modeling, Optical lithography, Switching, Manufacturing, Lithography
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