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Dr. Gijs ten Haaf
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 20 March 2019 Paper
Holistic feedforward control for the 5 nm logic node and beyond
Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens
Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449
KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control
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