Dr. Leendertjan Karssemeijer Profile

Dr. Leendertjan Karssemeijer

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 20 March 2019 Paper

Holistic feedforward control for the 5 nm logic node and beyond

Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens

Proceedings Volume 10961, 109610K (2019) https://doi.org/10.1117/12.2515449

KEYWORDS: Lithographic process control, Semiconducting wafers, Optical alignment, Overlay metrology, Sensors, Distortion, Scanners, Logic, Metrology, Process control

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Proceedings Article | 20 March 2019 Presentation + Paper

Improved wafer alignment model algorithm for better on-product overlay

Ik-Hyun Jeong, Hyun-Sok Kim, Yeong-Oh Kong, Ji-Hyun Song, Jae-Wuk Ju, Young-Sik Kim, Cees Lambregts, Miao Yu, Rizvi Rahman, Leendertjan Karssemeijer, Elliott McNamara, Paul Böcker, Jong-Cheol Choi, Nang-Lyeom Oh, Kang-San Lee, Jin-Seo Lee

Proceedings Volume 10961, 109610A (2019) https://doi.org/10.1117/12.2516259

KEYWORDS: Optical alignment, Semiconducting wafers, Calibration, Data modeling, Overlay metrology, Metrology, Scanners, High volume manufacturing, Lithography, Sensors

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Proceedings Article | 20 March 2018 Paper

Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models

Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudhar Raghunathan, Igor Aarts, Krishanu Shome, Jonathan Lee, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Leendertjan Karssemeijer, Irina Lyulina, Chung-Tien Li, Jan Hermans, Philippe Leray

Proceedings Volume 10587, 105870C (2018) https://doi.org/10.1117/12.2297493

KEYWORDS: Optical alignment, Monte Carlo methods, Overlay metrology, Polarization, Sensors, Chemical mechanical planarization, Etching, Scanners

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