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Hidetsugu Yano
at Tokyo Electron Kyushu Ltd
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Publications (1)
Proceedings Article | 26 March 2019 Paper
The defect mitigation on EUV stack by track based technology
Naoki Shibata, Lior Huli, Corey Lemley, Yuichiro Miyata, Dave Hetzer, Toshiharu Wada, Akiteru Ko, Shinichiro Kawakami, Akiko Kai, Takahiro Shiozawa, Hidetsugu Yano, Kenichi Ueda, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard
Proceedings Volume 10957, 109571J (2019) https://doi.org/10.1117/12.2514885
KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers
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