Mr. Hironori Oka Profile

Hironori Oka

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Publications (4)

SPIE Journal Paper | 4 November 2022

Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2 area-selective deposition

Rachel Nye, Kaat Van Dongen, Hironori Oka, Danilo De Simone, Gregory Parsons, Annelies Delabie

JM3, Vol. 21, Issue 04, 041407, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041407

KEYWORDS: Polymers, Extreme ultraviolet lithography, Atomic layer deposition, Extreme ultraviolet, Silicon, Polymer thin films, Annealing, Titanium dioxide, Photoresist processing, Etching

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Proceedings Article | 21 June 2022 Paper

A lithographic and etching study on EUV contact hole patterning for stochastic process mitigation towards advanced device scaling

D. De Simone, P. Foubert, R. Fallica, A. Dauendorffer, K. Nafus, N. Oikawa, H. Oka, K. Kato

Proceedings Volume PC12051, PC120510P (2022) https://doi.org/10.1117/12.2614165

KEYWORDS: Etching, Photoresist processing, Optical lithography, Stochastic processes, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, System on a chip, Metrology

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Proceedings Article | 25 May 2022 Presentation + Paper

Improving polymethacrylate EUV resists with TiO2 area-selective deposition

Rachel Nye, Kaat Van Dongen, Hironori Oka, Hajime Furutani, Gregory Parsons, Danilo De Simone, Annelies Delabie

Proceedings Volume 12055, 120550C (2022) https://doi.org/10.1117/12.2613815

KEYWORDS: Polymers, Atomic layer deposition, Extreme ultraviolet lithography, Titanium dioxide, Surface roughness, Surface properties, Chemically amplified resists

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Proceedings Article | 13 March 2018 Paper

Novel EUV resist materials for 7 nm node and beyond

Hajime Furutani, Michihiro Shirakawa, Wataru Nihashi, Kyohei Sakita, Hironori Oka, Mitsuhiro Fujita, Tadashi Omatsu, Toru Tsuchihashi, Nishiki Fujimaki, Toru Fujimori

Proceedings Volume 10586, 105860G (2018) https://doi.org/10.1117/12.2297076

KEYWORDS: Absorption, Polymers, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Lithography, Polymer thin films, Semiconducting wafers, Photons

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