Mr. James F. Bonafede Profile

James F. Bonafede

Senior Manager at Cymer

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Author

Publications (5)

Proceedings Article | 13 June 2022 Presentation

KrF Multi-focal imaging system for advanced and legacy applications

Will Conley, G. Padmabandu, Yzzer Roman, Yingbo Zhao, Toufiq Aman, James Bonafede, Emmanuel Rausa, Rasmus Nielsen, Ijen van Mil, Rongkuo Zhao

Proceedings Volume PC12051, PC120510B (2022) https://doi.org/10.1117/12.2615263

KEYWORDS: Imaging systems, Process control, Photoresist materials, Lithography, 3D image processing, Semiconducting wafers, Scanners, Overlay metrology, Optical lithography, Image processing

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Proceedings Article | 18 March 2019 Presentation

Quantifying global and local CD variation for an advanced 3D NAND layer (Conference Presentation)

Will Conley, Yaobin Feng, Zhiyang Song, Moran Guo, Jun He, Longxia Guo, Gang Xu, Simon Hsieh, James Bonafede, Stephen Hsu, Austin Peng, Jun Wei Lu, Victor Peng, Beeri Nativ, Fei Jia, Herman Nicolai, Ijen van Mil

Proceedings Volume 10961, 109610J (2019) https://doi.org/10.1117/12.2515725

KEYWORDS: Critical dimension metrology, Light sources, Semiconducting wafers, Yield improvement, Deep ultraviolet, Scanners, Control systems, Source mask optimization

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Proceedings Article | 16 March 2009 Paper

32nm node device laser-bandwidth OPE sensitivity and process matching

Kazuyuki Yoshimochi, Takao Tamura, Takaaki Kuribayashi, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 7274, 72742Q (2009) https://doi.org/10.1117/12.813987

KEYWORDS: SRAF, Logic devices, Critical dimension metrology, Optical simulations, Laser stabilization, Light sources, Combined lens-mirror systems, Computer simulations, Laser cutting, Tolerancing

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Proceedings Article | 11 April 2008 Paper

45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Kazuyuki Yoshimochi, Takao Tamura, Seiji Nagahara, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 6924, 69242K (2008) https://doi.org/10.1117/12.771628

KEYWORDS: Critical dimension metrology, Laser stabilization, Optical simulations, Nanoimprint lithography, Logic devices, Beam controllers, Chromatic aberrations, Lens design, Laser cutting, Light sources

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Proceedings Article | 12 March 2008 Paper

An intelligent imaging system for ArF scanner

Tomoyuki Matsuyama, Yasuhiro Ohmura, Toshiharu Nakashima, Yusaku Uehara, Taro Ogata, Hisashi Nishinaga, Hironori Ikezawa, Tsuyoshi Toki, Slava Rokitski, James Bonafede

Proceedings Volume 6924, 69241S (2008) https://doi.org/10.1117/12.771942

KEYWORDS: Imaging systems, Scanners, Optical proximity correction, Line width roughness, Control systems, Wavefronts, Optical lithography, Double patterning technology, Reticles, Metrology

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