Mr. John T. Nogatch Profile

John T. Nogatch

Principal Research and Development Engineer at Synopsys Inc

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Publications (7)

Proceedings Article | 11 May 2009 Paper

Multi-core advantages for mask data preparation

Johnny Yeap, John Nogatch

Proceedings Volume 7379, 73790Y (2009) https://doi.org/10.1117/12.824275

KEYWORDS: Photomasks, Computing systems, Parallel processing, Received signal strength, Data processing, Optical proximity correction, Information technology, Software development, Fourier transforms, Integrated circuits

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Proceedings Article | 18 March 2009 Paper

PML2: the maskless multibeam solution for the 22nm node and beyond

C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. Nogatch, A. Zepka

Proceedings Volume 7271, 72710N (2009) https://doi.org/10.1117/12.813670

KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Electrodes, Prototyping, Electron beam lithography, Electron beam direct write lithography, Silicon, Optical alignment, Photomasks

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Proceedings Article | 19 May 2008 Paper

Advanced mask data processing for 32nm and beyond

John Nogatch, Dan Hung, Raghava Kondepudy, Johnny Yeap

Proceedings Volume 7028, 702833 (2008) https://doi.org/10.1117/12.793108

KEYWORDS: Critical dimension metrology, Vestigial sideband modulation, Photomasks, Prototyping, Data processing, Error analysis, Visualization, Data conversion, Metrology, Optical simulations

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Proceedings Article | 30 October 2007 Paper

Teracomputing for mask data preparation

John Nogatch, Hartmut Kirsch, Kamal Mostafa, Glenn Newell, Johnny Yeap

Proceedings Volume 6730, 67303G (2007) https://doi.org/10.1117/12.746776

KEYWORDS: Computing systems, Computer aided design, Parallel computing, Photomasks, Optical proximity correction, Data storage, Distributed computing, Reticles, Semiconducting wafers, Parallel processing

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Proceedings Article | 11 May 2007 Paper

Data exploder for variable shaped beam exposure

John Nogatch, Hartmut Kirsch, Jun Shi

Proceedings Volume 6607, 66070W (2007) https://doi.org/10.1117/12.728946

KEYWORDS: Data conversion, Manufacturing, Data processing, Inspection, Beam shaping, Data modeling, Photomasks, Computing systems, Explosives, Data storage

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Proceedings Article | 20 May 2006 Paper

Fracture friendly optical proximity correction for non-Manhattan features

John Nogatch, Robert Lugg, Mike Miller, Frank Amoroso

Proceedings Volume 6283, 62832Q (2006) https://doi.org/10.1117/12.681804

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Image processing, Mask making, Critical dimension metrology, Data processing, Roads, Computed tomography

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Proceedings Article | 5 November 2005 Paper

Fracture friendly optical proximity correction

Frank Amoroso, Michel Cote, Tanya Do, Robert Lugg, John Nogatch

Proceedings Volume 5992, 599222 (2005) https://doi.org/10.1117/12.632220

KEYWORDS: Optical proximity correction, Photomasks, Optical alignment, Image enhancement, Semiconducting wafers, Image quality, Mask making, Image processing, Data processing, Roads

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Showing 5 of 7 publications

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