Mr. Hartmut Kirsch Profile

Hartmut Kirsch

R&D Manager

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 30 October 2007 Paper

Teracomputing for mask data preparation

John Nogatch, Hartmut Kirsch, Kamal Mostafa, Glenn Newell, Johnny Yeap

Proceedings Volume 6730, 67303G (2007) https://doi.org/10.1117/12.746776

KEYWORDS: Computing systems, Computer aided design, Parallel computing, Photomasks, Optical proximity correction, Data storage, Distributed computing, Reticles, Semiconducting wafers, Parallel processing

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Proceedings Article | 11 May 2007 Paper

Data exploder for variable shaped beam exposure

John Nogatch, Hartmut Kirsch, Jun Shi

Proceedings Volume 6607, 66070W (2007) https://doi.org/10.1117/12.728946

KEYWORDS: Data conversion, Manufacturing, Data processing, Inspection, Beam shaping, Data modeling, Photomasks, Computing systems, Explosives, Data storage

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Proceedings Article | 19 July 2000 Paper

Impact of pattern proximity correction on die-to-database mask inspection

Anja Rosenbusch, Vicky Bailey, Yair Eran, Reuven Falah, Shirley Hamar, Neil Holmes, Andrew Hourd, Hartmut Kirsch, Andrew McArthur

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392071

KEYWORDS: Inspection, Photomasks, Reticles, Critical dimension metrology, Mask making, Databases, Computer aided design, Optical proximity correction, Defect detection, Resolution enhancement technologies

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Proceedings Article | 30 December 1999 Paper

Incorporation of laser proximity correction into mask production

Anja Rosenbusch, James Unruh, Hartmut Kirsch, David Chan

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373347

KEYWORDS: Photomasks, Optical proximity correction, Mask making, Opacity, Reticles, Semiconducting wafers, Inspection, Image quality standards, Scanning electron microscopy, Computer aided design

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Proceedings Article | 26 July 1999 Paper

Application of a new approach to optical proximity correction

Anja Rosenbusch, Andrew Hourd, Casper Juffermans, Hartmut Kirsch, Frederic Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, Tom Vermeulen, John Watson, Wolfram Ziegler, Rainer Zimmermann

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354378

KEYWORDS: Optical proximity correction, Etching, Semiconducting wafers, Inspection, Deep ultraviolet, Reticles, Critical dimension metrology, Manufacturing, Mathematical modeling, Mask making

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Proceedings Article | 18 December 1998 Paper

New approach to optical proximity correction

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332856

KEYWORDS: Optical proximity correction, Reticles, Photomasks, Inspection, Data modeling, Manufacturing, Deep ultraviolet, Logic, Semiconducting wafers, Etching

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Showing 5 of 6 publications

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