Mr. Junjiro Sakai Profile

Junjiro Sakai

Senior Principal Engineer at Renesas Electronics Corp

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Author

Publications (7)

Proceedings Article | 16 March 2009 Paper

A proposed image intensity expressing local irradiance

Mitsuru Okuno, Akira Imai, Tetsuro Hanawa, Shinroku Maejima, Itaru Kanai, Shuji Nakao, Kazuyuki Suko, Naohisa Tamada, Junjiro Sakai

Proceedings Volume 7274, 72742Z (2009) https://doi.org/10.1117/12.812203

KEYWORDS: Polarization, Photomasks, Electromagnetism, Image filtering, Diffraction, Optical lithography, Magnetism, Lithography, Apodization, Radiometric corrections

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Proceedings Article | 26 March 2007 Paper

OPC-free on-grid fine random hole pattern formation utilizing double resist patterning with double RETs

Takeshi Yamamoto, Kazuyuki Sukoh, Akira Imai, Shinroku Maejima, Shuji Nakao, Atsumi Yamaguchi, Tetsuro Hanawa, Junjiro Sakai, Yoshiharu Ono

Proceedings Volume 6520, 65203W (2007) https://doi.org/10.1117/12.711055

KEYWORDS: Optical lithography, Scanning electron microscopy, Photography, Double patterning technology, Photomasks, Photoresist processing, Resolution enhancement technologies, Argon, Ion implantation, Current controlled current source

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Proceedings Article | 15 March 2006 Paper

Application of super-diffraction lithography (SDL) for an actual device fabrication

Akihiro Nakae, Junjiro Sakai, Koichiro Narimatsu, Shuji Nakao, Itaru Kanai, Shinroku Maejima, Kazuyuki Suko

Proceedings Volume 6154, 61542A (2006) https://doi.org/10.1117/12.656043

KEYWORDS: Photomasks, Critical dimension metrology, Printing, Photography, Lithography, Scanning electron microscopy, Optical proximity correction, Logic devices, Resolution enhancement technologies, Binary data

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Proceedings Article | 26 June 2003 Paper

Simple and highly sensitive focus monitoring utilizing an aperture on backside of photomask

Ken-ichi Itano, Hidehiko Kozawa, Atsushi Ueno, Akihiro Nakae, Shinroku Maejima, Shuji Nakao, Kouichirou Tsujita, Akira Tokui, Junjirou Sakai, Shigenori Yamashita

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485324

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Modulation, Overlay metrology, Monochromatic aberrations, Geometrical optics, Double patterning technology, Quartz, Wafer-level optics

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Proceedings Article | 12 June 2003 Paper

Relationship between optical property of pattern image and adhesion of resist pattern

Junjiro Sakai, Atsumi Yamaguchi, Kouichirou Tsujita, Akihiro Nakae

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483760

KEYWORDS: Reflectivity, Photoresist materials, Oxides, Photomasks, Phase shifts, Optical properties, Interfaces, Lithography, Neodymium, Refractive index

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Proceedings Article | 29 June 1998 Paper

Influence of aberration on performance during use of resolution enhancement technology

Wataru Wakamiya, Junjiro Sakai, Shuji Nakao, Akihiro Nakae, Kouichirou Tsujita

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310820

KEYWORDS: Monochromatic aberrations, Printing, Optical proximity correction, Resolution enhancement technologies, Phase shifts, Imaging systems, Photomasks, Projection systems, Lithographic illumination, Lithography

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Proceedings Article | 7 July 1997 Paper

Dry etching resistance of resist base polymer and its improvement

Yasuji Matsui, Kouichirou Tsujita, Junjiro Sakai, Yoshika Kimura, Shinji Kishimura

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275894

KEYWORDS: Polymers, Resistance, Etching, Dry etching, Deep ultraviolet, Chlorine, Plasma, Temperature metrology, Molecules, Absorbance

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Showing 5 of 7 publications

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