CONFERENCE PROCEEDINGS
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Dr. Katsuhiko Hieda
Manager at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 23 April 2008 Paper
High refractive index materials design for the next generation ArF immersion lithography
Taiichi Furukawa, Takanori Kishida, Kyouyuu Yasuda, Tsutomu Shimokawa, Zhi Liu, Mark Slezak, Katsuhiko Hieda
Proceedings Volume 6924, 692412 (2008) https://doi.org/10.1117/12.771122
KEYWORDS: Transmittance, Contamination, Absorbance, Microfluidics, Immersion lithography, Refractive index, Water, Laser irradiation, Ultraviolet radiation, Transparency
Proceedings Article | 9 April 2007 Paper
High-refractive index material design for ArF immersion lithography
Taiichi Furukawa, Takanori Kishida, Takashi Miyamatsu, Kazuo Kawaguchi, Kinji Yamada, Tetsuo Tominaga, Mark Slezak, Katsuhiko Hieda
Proceedings Volume 6519, 65190B (2007) https://doi.org/10.1117/12.711988
KEYWORDS: Refractive index, Absorbance, Immersion lithography, Water, Transparency, Transmittance, Optical properties, Ultraviolet radiation, Manufacturing, Laser irradiation
Proceedings Article | 11 April 2006 Paper
High-refractive-index fluids for the next-generation ArF immersion lithography
Yong Wang, Takashi Miyamatsu, Taiichi Furukawa, Kinji Yamada, Tetsuo Tominaga, Yutaka Makita, Hiroki Nakagawa, Atsushi Nakamura, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsuhiko Hieda
Proceedings Volume 6153, 61530A (2006) https://doi.org/10.1117/12.656022
KEYWORDS: Refractive index, Water, Immersion lithography, Ultraviolet radiation, Absorbance, Laser irradiation, Absorption, Photoresist materials, Transmittance, Prisms
Proceedings Article | 11 April 2006 Paper
Application of high-refractive index fluid to KrF-immersion lithography
Yuji Yada, Koji Ito, Yoshikazu Yamaguchi, Taiichi Furukawa, Takashi Miyamatsu, Yong Wang, Katsuhiko Hieda, Tsutomu Shimokawa
Proceedings Volume 6153, 61531W (2006) https://doi.org/10.1117/12.655983
KEYWORDS: Photoresist materials, Lithography, Refractive index, Semiconducting wafers, Immersion lithography, Microfluidics, Absorbance, Transmittance, 193nm lithography, Water
Proceedings Article | 4 May 2005 Paper
Material design for immersion lithography with high refractive index fluid (HIF)
Takashi Miyamatsu, Yong Wang, Motoyuki Shima, Shiro Kusumoto, Takashi Chiba, Hiroki Nakagawa, Katsuhiko Hieda, Tsutomu Shimokawa
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599165
KEYWORDS: Refractive index, Photoresist materials, Water, Immersion lithography, Ultraviolet radiation, Lithography, Transmittance, Semiconducting wafers, Interferometry, Transparency
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