Dr. Taiichi Furukawa Profile

Dr. Taiichi Furukawa

Senior Researcher at JSR Micro Inc

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Author

Publications (6)

Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Proceedings Article | 18 March 2009 Paper

Characterization of vinyl ether UV-cure nanoimprint resist

Taiichi Furukawa, Frances Houle, Deborah Casher, Dolores Miller

Proceedings Volume 7271, 727129 (2009) https://doi.org/10.1117/12.813065

KEYWORDS: Quartz, Metals, Adhesives, Silicon, Sputter deposition, Ultraviolet radiation, Humidity, Protactinium, Roads, Polymers

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Proceedings Article | 23 April 2008 Paper

High refractive index materials design for the next generation ArF immersion lithography

Taiichi Furukawa, Takanori Kishida, Kyouyuu Yasuda, Tsutomu Shimokawa, Zhi Liu, Mark Slezak, Katsuhiko Hieda

Proceedings Volume 6924, 692412 (2008) https://doi.org/10.1117/12.771122

KEYWORDS: Transmittance, Contamination, Absorbance, Microfluidics, Immersion lithography, Refractive index, Water, Laser irradiation, Ultraviolet radiation, Transparency

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Proceedings Article | 9 April 2007 Paper

High-refractive index material design for ArF immersion lithography

Taiichi Furukawa, Takanori Kishida, Takashi Miyamatsu, Kazuo Kawaguchi, Kinji Yamada, Tetsuo Tominaga, Mark Slezak, Katsuhiko Hieda

Proceedings Volume 6519, 65190B (2007) https://doi.org/10.1117/12.711988

KEYWORDS: Refractive index, Absorbance, Immersion lithography, Water, Transparency, Transmittance, Optical properties, Ultraviolet radiation, Manufacturing, Laser irradiation

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Proceedings Article | 11 April 2006 Paper

Application of high-refractive index fluid to KrF-immersion lithography

Yuji Yada, Koji Ito, Yoshikazu Yamaguchi, Taiichi Furukawa, Takashi Miyamatsu, Yong Wang, Katsuhiko Hieda, Tsutomu Shimokawa

Proceedings Volume 6153, 61531W (2006) https://doi.org/10.1117/12.655983

KEYWORDS: Photoresist materials, Lithography, Refractive index, Semiconducting wafers, Immersion lithography, Microfluidics, Absorbance, Transmittance, 193nm lithography, Water

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Proceedings Article | 11 April 2006 Paper

High-refractive-index fluids for the next-generation ArF immersion lithography

Yong Wang, Takashi Miyamatsu, Taiichi Furukawa, Kinji Yamada, Tetsuo Tominaga, Yutaka Makita, Hiroki Nakagawa, Atsushi Nakamura, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsuhiko Hieda

Proceedings Volume 6153, 61530A (2006) https://doi.org/10.1117/12.656022

KEYWORDS: Refractive index, Water, Immersion lithography, Ultraviolet radiation, Absorbance, Laser irradiation, Absorption, Photoresist materials, Transmittance, Prisms

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Showing 5 of 6 publications

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