Mr. Keisuke Yagawa Profile

Keisuke Yagawa

at Toshiba Corp

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Author

Publications (6)

Proceedings Article | 13 July 2017 Paper

Application of EB repair for nanoimprint lithography template

Ai Kumada, Keiko Morishita, Keisuke Yagawa, Ryoji Yoshikawa, Takashi Hirano, Masamitsu Itoh

Proceedings Volume 10454, 104540Q (2017) https://doi.org/10.1117/12.2280685

KEYWORDS: Nanoimprint lithography, Lithography, Critical dimension metrology, Etching, Scanning electron microscopy, Electron beam lithography, Semiconducting wafers, Electron beams, Optical lithography, Semiconductors

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Proceedings Article | 5 October 2016 Paper

High-performance fabrication process for 2xnm hole-NIL template production

Keisuke Yagawa, Machiko Suenaga, Takeharu Motokawa, Mana Tanabe, Akihiko Ando, Eiji Yamanaka, Keiko Morishita, Shingo Kanamitsu, Masato Saito, Masamitsu Itoh

Proceedings Volume 9985, 99852E (2016) https://doi.org/10.1117/12.2243575

KEYWORDS: Lithography, Nanoimprint lithography, Image quality, Etching, Photoresist processing, Optical lithography, Defect inspection, X-rays, Double patterning technology, Semiconducting wafers

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Proceedings Article | 10 May 2016 Paper

High resolution hole patterning with EB lithography for NIL template production

Mana Tanabe, Keisuke Yagawa, Takeharu Motokawa, Kazuki Hagihara, Machiko Suenaga, Masato Saito, Shingo Kanamitsu, Masamitsu Itoh

Proceedings Volume 9984, 99840T (2016) https://doi.org/10.1117/12.2242363

KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Dry etching, Image processing, Photoresist processing, Etching, Scanning electron microscopy, Semiconducting wafers, Vestigial sideband modulation

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Proceedings Article | 1 April 2016 Paper

Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Shingo Kanamitsu, Takeharu Motokawa, Kazuki Hagihara, Yukiyasu Arisawa, Sachiko Kobayashi, Masato Saito, Masamitsu Ito

Proceedings Volume 9777, 97771I (2016) https://doi.org/10.1117/12.2218809

KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Backscatter, Photoresist processing, Beam shaping, Solids, Data conversion, Semiconductors

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Proceedings Article | 28 July 2014 Paper

High performance mask fabrication process for the next-generation mask production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 9256, 925608 (2014) https://doi.org/10.1117/12.2069651

KEYWORDS: Photomasks, Optical lithography, Mask making, Photoresist processing, Lithography, Scanning electron microscopy, Beam shaping, Vestigial sideband modulation, Error analysis, Double patterning technology

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Proceedings Article | 9 September 2013 Paper

Potential of mask production process for finer pattern fabrication

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 8880, 88802N (2013) https://doi.org/10.1117/12.2033257

KEYWORDS: Photomasks, Vestigial sideband modulation, Extreme ultraviolet, Lithography, Nanoimprint lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Image analysis, Optical design, Optical lithography

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Showing 5 of 6 publications

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