Dr. Li Wang Profile

Dr. Li Wang

Post-Doc at Paul Scherrer Institut

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Publications (6)

Proceedings Article | 27 March 2017 Paper

High-aspect ratio silicon structures by displacement Talbot lithography and Bosch etching

Konstantins Jefimovs, Lucia Romano, Joan Vila-Comamala, Matias Kagias, Zhentian Wang, Li Wang, Christian Dais, Harun Solak, Marco Stampanoni

Proceedings Volume 10146, 101460L (2017) https://doi.org/10.1117/12.2258007

KEYWORDS: Lithography, Semiconducting wafers, Photomasks, Lithographic illumination, Reactive ion etching, Silicon, Phase contrast, X-ray imaging, Etching, Optical lithography, X-rays, Photoresist materials, Chromium

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Proceedings Article | 1 April 2013 Paper

Patterning at 6.5 nm wavelength using interference lithography

Nassir Mojarad, Michaela Vockenhuber, Li Wang, Bernd Terhalle, Yasin Ekinci

Proceedings Volume 8679, 867924 (2013) https://doi.org/10.1117/12.2011556

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Photomasks, Lithography, Line edge roughness, Photoresist materials, Diffraction gratings, Diffraction, Semiconducting wafers

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Proceedings Article | 1 April 2013 Paper

Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond

Yasin Ekinci, Michaela Vockenhuber, Mohamad Hojeij, Li Wang, Nassir Mojarad

Proceedings Volume 8679, 867910 (2013) https://doi.org/10.1117/12.2011533

KEYWORDS: Line edge roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Optical lithography, Critical dimension metrology, Photomasks, Error analysis, Nanostructures

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The performance of EUV resists is one of the main challenges for the cost-effectiveness and the introduction of EUV lithography into high-volume manufacturing. The EUV interference lithography (EUV-IL) is a simple and powerful technique to print periodic nanostructures with a resolution beyond the capabilities of other tools. In addition, the well-defined and pitch-independent aerial image of the EUV-IL provides further advantages for the analysis of resist performance. In this paper, we present evaluation of chemically-amplified resists (CAR) and inorganic resists using EUV-IL. We illustrate the performance of the tool through a reproducibility study of a baseline resist over the course of 16 months. A comparative study of the performance of different resists is presented with the aim of resolving patterns with CARs for 16 nm half-pitch (HP) and 11 nm HP. Critical dimension (CD) and line-edge roughness (LER) are evaluated as functions of dose for different process conditions. With a CAR with about 10 mJ/cm² sensitivity, 18 nm L/S patterns are obtained with low LER and well-resolved patterns are achieved down to 16 nm HP. With another CAR of about 35 mJ/cm² sensitivity, L/S patterns with low LER are demonstrated down to 14 nm HP. Resolved patterns are achieved down to 12 HP, demonstrating the capability of its potential towards 11 nm HP if pattern collapse mitigation can be successfully applied. With EUV-sensitive inorganic resists, patterning down to 8 nm has been realized. In summary, we show that resist platforms with reasonable sensitivities are already available for patterning at 16 nm HP, 11 nm HP, and beyond, although there is still significant progress is needed. We also show that with decreasing HP, pattern collapse becomes a crucial issue limiting the resolution and LER. Therefore resist stability, collapse mitigation, and etch resistance are some of the significant problems to be addressed in the development of resist platforms for future technology nodes.

Proceedings Article | 1 May 2012 Paper

Strong magnetism by closely spaced gold nanohoops

M. Lorente-Crespo, R. Ortuño, I. Alepuz-Benaches, C. García-Meca, Li Wang, Y. Ekinci, A. Martínez

Proceedings Volume 8423, 84231V (2012) https://doi.org/10.1117/12.921801

KEYWORDS: Magnetism, Gold, Terahertz radiation, Metamaterials, Glasses, Resonance enhancement, Metals, Near infrared, Infrared spectroscopy, Spectroscopy

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Proceedings Article | 1 May 2012 Paper

High performance Al bi-layer wire-grid polarizer for deep-ultraviolet to infrared: modeling and design

Li Wang, Harun Solak, Yasin Ekinci

Proceedings Volume 8424, 842429 (2012) https://doi.org/10.1117/12.921837

KEYWORDS: Aluminum, Polarizers, Deep ultraviolet, Metals, Nanofabrication, Visible radiation, Infrared radiation, Polarization, Nanophotonics, Nanoimprint lithography

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Proceedings Article | 23 March 2012 Paper

Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning

Yasin Ekinci, Michaela Vockenhuber, Bernd Terhalle, Mohamad Hojeij, Li Wang, Todd Younkin

Proceedings Volume 8322, 83220W (2012) https://doi.org/10.1117/12.916541

KEYWORDS: Line edge roughness, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Diffraction gratings, Photomasks, Optical lithography, Diffraction, Electron beam lithography

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Showing 5 of 6 publications

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