Dr. Markus Bauer Profile

Dr. Markus Bauer

at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 1 October 2020 Open Access

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer

JM3, Vol. 19, Issue 04, 041001, (October 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.041001

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Proceedings Article | 24 March 2020 Presentation

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography (Conference Presentation)

Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer

Proceedings Volume 11323, 1132309 (2020) https://doi.org/10.1117/12.2550882

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Imaging systems, Extreme ultraviolet, Refractive index, Nanoimprint lithography, Reflectivity, Tantalum, Lithographic illumination

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Proceedings Article | 23 October 2018 Presentation + Paper

AIMS™ EUV tool platform: aerial-image based qualification of EUV masks

Renzo Capelli, Martin Dietzel, Dirk Hellweg, Grizelda Kersteen, Ralf Gehrke, Markus Bauer

Proceedings Volume 10810, 108100V (2018) https://doi.org/10.1117/12.2501379

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Image processing, Metrology, 3D image processing, High volume manufacturing, 193nm lithography, Lithography, Reflectivity

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SPIE Journal Paper | 11 August 2018 Open Access

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer

JM3, Vol. 18, Issue 01, 011005, (August 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011005

KEYWORDS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data

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Proceedings Article | 19 March 2018 Presentation + Paper

Attenuated PSM for EUV: Can they mitigate 3D mask effects?

Andreas Erdmann, Peter Evanschitzky, Hazem Mesilhy, Vicky Philipsen, Eric Hendrickx, Markus Bauer

Proceedings Volume 10583, 1058312 (2018) https://doi.org/10.1117/12.2299648

KEYWORDS: Photomasks, Refractive index, Nickel, Ruthenium, Phase shifts, Extreme ultraviolet, Lithography, Reflectivity, Thin films

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