Masaaki Yoshida
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 11 April 2006 Paper
Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori, Toshikazu Takayama, Keita Ishizuka, Masaaki Yoshida, Tomoyuki Hirano, Jiro Yokoya, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa
Proceedings Volume 6153, 615309 (2006) https://doi.org/10.1117/12.656164
KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Resonance energy transfer, Lithography, Materials processing, Bridges, 193nm lithography, Molecular bridges, Lens design

Proceedings Article | 4 May 2005 Paper
Hiromitsu Tsuji, Masaaki Yoshida, Keita Ishizuka, Tomoyuki Hirano, Kotaro Endo, Mitsuru Sato
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599485
KEYWORDS: Semiconducting wafers, Immersion lithography, Photoresist processing, Manufacturing, Silicon, Ions, Silicon films, Lithography, Contamination, Scanners

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536168
KEYWORDS: Polymers, Electron beam lithography, Protactinium, Lithography, Electroluminescence, Projection lithography, Optical lithography, Semiconducting wafers, Neodymium, Electron beams

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