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Masamichi Yoshida
at Sony Semiconductor Manufacturing Corp
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Publications (3)
Proceedings Article | 20 April 2011 Paper
Automated CD-SEM recipe creation technology for mass production using CAD data
Wataru Nagatomo, Naokaka Adachi, Toshikazu Kawahara, Masamichi Yoshida, Hiroyuki Nakano, Yuichi Abe, Sanyu Ido, Masashi Tanaka
Proceedings Volume 7971, 79712V (2011) https://doi.org/10.1117/12.890215
KEYWORDS: Computer aided design, Scanning electron microscopy, Inspection equipment, Optical alignment, Semiconducting wafers, Semiconductors, Algorithm development, Image processing, Signal processing, Semiconductor manufacturing
Proceedings Article | 29 March 2006 Paper
Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR
Eriko Matsui, Nobuyuki Matsuzawa, Hiroichi Kawahira, Kazi M. A. Salam, Takeshi Iwai, Hiroyuki Nakano, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Makiko Irie, Atsuhiro Ando, Masashi Yoshida
Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002
KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers
Proceedings Article | 20 August 2004 Paper
Advanced mask pattern correction method of alternating PSM: improvement of line width uniformity in the shifter length direction
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557800
KEYWORDS: Optical proximity correction, Distortion, Image segmentation, Model-based design, Critical dimension metrology, Phase shifts, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Wafer-level optics
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