Dr. Muthiah Thiyagarajan Profile

Dr. Muthiah Thiyagarajan

Research Scientist at EMD Electronics

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Author

Publications (6)

Proceedings Article | 1 April 2009 Paper

Comparison of thermal flow and chemical shrink processes for 193 nm contact hole patterning

Takanori Kudo, Charito Antonio, John Sagan, Srinivasan Chakrapani, Deepa Parthasarathy, Sungeun Hong, Muthiah Thiyagarajan, Yi Cao, Munirathna Padmanaban

Proceedings Volume 7273, 72730X (2009) https://doi.org/10.1117/12.816633

KEYWORDS: Chemical reactions, Photoresist processing, Polymers, Semiconducting wafers, Industrial chemicals, Lithography, Optical lithography, Glasses, Resolution enhancement technologies, Fourier transforms

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Proceedings Article | 29 March 2006 Paper

Effects of material design on extreme ultraviolet (EUV) resist outgassing

Kim Dean, Kenneth Gonsalves, Muthiah Thiyagarajan

Proceedings Volume 6153, 61531E (2006) https://doi.org/10.1117/12.657163

KEYWORDS: Polymers, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Contamination, Diffusion, EUV optics, Calibration, Line width roughness, Carbon

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Proceedings Article | 29 March 2006 Paper

Study of the effect of amine additives on LWR and LER

Francis Houlihan, David Rentkiewicz, Guanyang Lin, Dalil Rahman, Douglas Mackenzie, Allen Timko, Takanori Kudo, Clement Anyadiegwu, Muthiah Thiyagarajan, Simon Chiu, Andrew Romano, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615317 (2006) https://doi.org/10.1117/12.659465

KEYWORDS: Line edge roughness, Line width roughness, Polymers, Semiconducting wafers, Lithography, Transistors, Diffusion, Photoresist processing, Critical dimension metrology, Control systems

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Proceedings Article | 4 May 2005 Paper

Newly developed polymer bound photoacid generator resist for sub-100-nm pattern by EUV lithography

Kenneth Gonsalves, Muthiah Thiyagarajan, Kim Dean

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.602087

KEYWORDS: Polymers, Extreme ultraviolet lithography, Lithography, Polymerization, Chemically amplified resists, Resistance, Photomicroscopy, Scanning electron microscopy, Electron beam lithography, Polymethylmethacrylate

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Proceedings Article | 4 May 2005 Paper

Material design and evaluation of nanocomposite resist for next generation lithography

Kenneth Gonsalves, Muthiah Thiyagarajan, Kim Dean, Patricia Santiago, L. Rendon, Augustin Jeyakumar, Clifford Henderson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.597308

KEYWORDS: Etching, Polymers, Plasma etching, Nanocomposites, Lithography, Plasma, Reactive ion etching, Electron beam lithography, Resistance, Silicon films

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SPIE Journal Paper | 1 April 2005

New resists for nanometer scale patterning by extreme ultraviolet lithography

Kenneth Gonsalves, Muthiah Thiyagarajan, Kim Dean

JM3, Vol. 4, Issue 02, 029701, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898604

KEYWORDS: Polymers, Extreme ultraviolet lithography, Lithography, Optical lithography, Extreme ultraviolet, Photoresist materials, Photomicroscopy, Etching, Resistance, Nanotechnology

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Showing 5 of 6 publications

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