Prof. Clifford L. Henderson
Dean, College of Engineering
SPIE Involvement:
Author
Area of Expertise:
lithography , photoresists , functional materials , polymers , nanofabrication , semiconductor processing
Websites:
Profile Summary

Dr. Clifford L. Henderson is the Dean of the College of Engineering at the University of Alabama and a Professor in the Department of Chemical and Biological Engineering. Prior to joining the University of Alabama in 2022, he previously served as Department Chair for the Department of Chemical, Biological, and Materials Engineering at the University of South Florida from 2016 through 2022, and prior to that spent the first 18 years of his academic career at the Georgia Institute of Technology. Dean Henderson received his Bachelor of Science in Chemical Engineering with Highest Honors from the Georgia Institute of Technology and his Master of Science and Doctor of Philosophy in Chemical Engineering from The University of Texas at Austin.

Dean Henderson’s research focuses on problems at the intersection of chemical engineering, organic and polymeric materials science, and micro- and nanotechnology in a variety of application areas including electronics, energy, and biotechnology. Dean Henderson has served in a variety of national leadership roles related to his academic engineering career and his research interests, including prior service as the Functional Materials Program Director within the Civil, Mechanical, and Manufacturing Innovation (CMMI) Division at the National Science Foundation.

Dean Henderson has received numerous awards and recognition for his research and service work including an NSF CAREER Award, the inaugural Intel/STC Outstanding Lithography Researcher Award, the AIChE Herb Epstein Award, and the AIChE Gary Leach Award. Dr. Henderson has been elected as a Fellow of the International Society for Optics and Photonics (SPIE) in 2010, a Fellow of the American Association for the Advancement of Science (AAAS) in 2017, and a Fellow of the American Institute of Chemical Engineers (AIChE) in 2018.
Publications (119)

Proceedings Article | 23 March 2020 Paper
Jakin Delony, Peter Ludovice, Clifford Henderson
Proceedings Volume 11326, 113261K (2020) https://doi.org/10.1117/12.2563896
KEYWORDS: Bridges, Directed self assembly, Thin films, Annealing, Computer simulations, Polymers, Molecular bridges

Proceedings Article | 25 March 2019 Paper
Caleb Breaux, Peter Ludovice, Clifford Henderson
Proceedings Volume 10960, 109601L (2019) https://doi.org/10.1117/12.2526417
KEYWORDS: Polymers, Line edge roughness, Line width roughness, Interfaces, Annealing, Thin films, Diffusion, Optical lithography, Resistance, Directed self assembly

Proceedings Article | 25 March 2019 Paper
Jakin Delony, Peter Ludovice, Clifford Henderson
Proceedings Volume 10960, 109601M (2019) https://doi.org/10.1117/12.2526418
KEYWORDS: Line edge roughness, Line width roughness, Thin films, Directed self assembly, Polymers, Computer simulations, Optical lithography, Molecular self-assembly, Modulation, Etching

Proceedings Article | 4 April 2018 Paper
Caleb Breaux, Jakin Delony, Peter Ludovice, Clifford Henderson
Proceedings Volume 10584, 105841H (2018) https://doi.org/10.1117/12.2318642
KEYWORDS: Line edge roughness, Line width roughness, Interfaces, Polymers, Thin films, Directed self assembly, Computer simulations, Device simulation, Solids, Molecular self-assembly

SPIE Journal Paper | 22 November 2017 Open Access
Benjamin Nation, Peter Ludovice, Clifford Henderson
JM3, Vol. 16, Issue 04, 043505, (November 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.043505
KEYWORDS: Interfaces, Thin films, Polymers, Bridges, Optical lithography, Polymerization, Device simulation, Skin, Algorithms, Directed self assembly

SPIE Journal Paper | 27 October 2017
Benjamin D. Nation, Andrew J. Peters, Richard A. Lawson, Peter J. Ludovice, Clifford L. Henderson
JM3, Vol. 16, Issue 04, 043502, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.043502
KEYWORDS: Line edge roughness, Line width roughness, Optical lithography, Double patterning technology, Interfaces, Directed self assembly, Polymers, Polymerization, Etching, Chemical species

SPIE Journal Paper | 20 October 2017 Open Access
Benjamin Nation, Caleb Breaux, Peter Ludovice, Clifford Henderson
JM3, Vol. 16, Issue 04, 043501, (October 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.043501
KEYWORDS: Directed self assembly, Thermodynamics, Polymers, Annealing, Nanoimprint lithography, Extreme ultraviolet lithography, Device simulation, Optical lithography, Semiconductors, Lithography

Proceedings Article | 19 April 2017 Paper
Benjamin Nation, Caleb Breaux, Peter Ludovice, Clifford Henderson
Proceedings Volume 10146, 101461T (2017) https://doi.org/10.1117/12.2276197
KEYWORDS: Thermodynamics, Directed self assembly, Polymers, Device simulation, Annealing, Optical lithography, Thin films, Feature extraction, Computer simulations, Molecular self-assembly

SPIE Journal Paper | 10 May 2016 Open Access
Andrew Peters, Richard Lawson, Benjamin Nation, Peter Ludovice, Clifford Henderson
JM3, Vol. 15, Issue 02, 023505, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023505
KEYWORDS: Directed self assembly, Thermodynamics, Polymers, Interfaces, Computer simulations, Polymerization, Systems modeling, Binary data, Thin films, Semiconductors

Proceedings Article | 1 April 2016 Paper
Benjamin Nation, Peter Ludovice, Clifford Henderson
Proceedings Volume 9777, 97771V (2016) https://doi.org/10.1117/12.2219255
KEYWORDS: Directed self assembly, Molecular self-assembly, Lithography, Optical lithography, Industrial chemicals, Bridges, Polymers, Skin, Polymerization, Algorithms, Microelectronics, Process modeling, Device simulation

SPIE Journal Paper | 8 March 2016
Andrew Peters, Richard Lawson, Benjamin Nation, Peter Ludovice, Clifford Henderson
JM3, Vol. 15, Issue 01, 013508, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013508
KEYWORDS: Directed self assembly, Thin films, Interfaces, Polymers, Annealing, Diffusion, Scattering, Computer simulations, Process control

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94250A (2015) https://doi.org/10.1117/12.2086007
KEYWORDS: Silicon, Molecules, Optical lithography, Extreme ultraviolet, Standards development, Oxides, Glasses, Polymerization, Switches, Polymers

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94250C (2015) https://doi.org/10.1117/12.2086027
KEYWORDS: Glasses, Lithography, Polymerization, Polymers, Extreme ultraviolet lithography, Diffusion, Scanning electron microscopy, Extreme ultraviolet, Optical lithography, Light sources

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94251S (2015) https://doi.org/10.1117/12.2086039
KEYWORDS: Glasses, Standards development, Polymers, Polymerization, Molecules, Scanning electron microscopy, Photoresist developing, Semiconducting wafers, Silicon, Line edge roughness

Proceedings Article | 19 March 2015 Paper
Benjamin Nation, Andrew Peters, Richard Lawson, Peter Ludovice, Clifford Henderson
Proceedings Volume 9423, 94231J (2015) https://doi.org/10.1117/12.2085526
KEYWORDS: Line edge roughness, Chemical analysis, Optical lithography, Polymers, Double patterning technology, Data modeling, Molecular self-assembly, Chemical species, Thin films, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 94240K (2015) https://doi.org/10.1117/12.2086051
KEYWORDS: Scanning electron microscopy, Line edge roughness, Line scan image sensors, 3D modeling, Metrology, Monte Carlo methods, Surface roughness, Scattering, 3D metrology, Stochastic processes

Proceedings Article | 19 March 2015 Paper
Richard Lawson, Andrew Peters, Benjamin Nation, Peter Ludovice, Clifford Henderson
Proceedings Volume 9423, 94231L (2015) https://doi.org/10.1117/12.2086047
KEYWORDS: Interfaces, Polymers, Thin films, Systems modeling, Molecular self-assembly, Computer simulations, Lithography, Physics, Visualization, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Andrew Peters, Richard Lawson, Benjamin Nation, Peter Ludovice, Clifford Henderson
Proceedings Volume 9423, 94231Y (2015) https://doi.org/10.1117/12.2085518
KEYWORDS: Thin films, Polymers, Interfaces, Diffusion, Neodymium, Bridges, Annealing, Computer simulations, Process control, Directed self assembly

SPIE Journal Paper | 20 August 2014
Richard Lawson, Andrew Peters, Benjamin Nation, Peter Ludovice, Clifford Henderson
JM3, Vol. 13, Issue 03, 031308, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031308
KEYWORDS: Interfaces, Polymers, Thin films, Computer simulations, Molecular self-assembly, Lithography, Physics, Picosecond phenomena, Manufacturing, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Andrew Peters, Richard Lawson, Benjamin Nation, Peter Ludovice, Clifford Henderson
Proceedings Volume 9049, 90492E (2014) https://doi.org/10.1117/12.2046664
KEYWORDS: Polymers, Thermodynamics, Systems modeling, Monte Carlo methods, System integration, Molecular interactions, Semiconductors, Motion models, Polymerization, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Benjamin Nation, Andrew Peters, Richard Lawson, Peter Ludovice, Clifford Henderson
Proceedings Volume 9049, 90492K (2014) https://doi.org/10.1117/12.2046629
KEYWORDS: Polymers, Computer simulations, Chemical species, Process modeling, Molecular self-assembly, Chemical engineering, Optical alignment, Semiconductor manufacturing, Feature extraction, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Richard Lawson, Andrew Peters, Benjamin Nation, Peter Ludovice, Clifford Henderson
Proceedings Volume 9049, 90490S (2014) https://doi.org/10.1117/12.2046603
KEYWORDS: Interfaces, Polymers, Thin films, Computer simulations, Lithography, Physics, Chemistry, Manufacturing, Photoresist materials, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Benjamin Nation, Andrew Peters, Richard Lawson, Peter Ludovice, Clifford Henderson
Proceedings Volume 9049, 90491C (2014) https://doi.org/10.1117/12.2046626
KEYWORDS: Polymers, Chemical species, Molecular self-assembly, Statistical modeling, Lithography, Computer simulations, Chemical analysis, Optical lithography, Physics, Directed self assembly

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 90510Q (2014) https://doi.org/10.1117/12.2046616
KEYWORDS: Line edge roughness, Polymerization, Optical lithography, Extreme ultraviolet, Molecules, Deep ultraviolet, Polymers, Diffusion, Glasses, Control systems

Proceedings Article | 27 March 2014 Paper
Proceedings Volume 9051, 90510E (2014) https://doi.org/10.1117/12.2046619
KEYWORDS: Molecules, Polymerization, Optical lithography, Polymers, Glasses, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Switches, Photoresist materials

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8682, 868221 (2013) https://doi.org/10.1117/12.2021141
KEYWORDS: Polymers, Deep ultraviolet, Electron beam lithography, Molecules, Line edge roughness, Chemically amplified resists, Capillaries, Lithography, Extreme ultraviolet lithography, Optical lithography

Proceedings Article | 5 April 2013 Paper
Proceedings Volume 8680, 86801Z (2013) https://doi.org/10.1117/12.2021442
KEYWORDS: Polymers, Critical dimension metrology, Molecular self-assembly, Lithography, Interfaces, Image segmentation, Directed self assembly, Polymerization, Computer simulations, Silver

Proceedings Article | 5 April 2013 Paper
Proceedings Volume 8680, 86801Y (2013) https://doi.org/10.1117/12.2021439
KEYWORDS: Polymers, Molecular self-assembly, Polymerization, Lithography, Interfaces, Computer simulations, Systems modeling, Graphics processing units, Molecular interactions, Directed self assembly

Proceedings Article | 5 April 2013 Paper
Proceedings Volume 8680, 86801X (2013) https://doi.org/10.1117/12.2021420
KEYWORDS: Polymers, Annealing, Polymerization, Scanning electron microscopy, Picosecond phenomena, Thin films, Nitrogen, Directed self assembly, Polymer thin films, Glasses

Proceedings Article | 5 April 2013 Paper
Proceedings Volume 8680, 86801W (2013) https://doi.org/10.1117/12.2021417
KEYWORDS: Polymers, Annealing, Lithography, FT-IR spectroscopy, Optical lithography, Etching, Magnesium, Solids, Polymerization, Directed self assembly

Proceedings Article | 5 April 2013 Paper
Proceedings Volume 8680, 86801V (2013) https://doi.org/10.1117/12.2021414
KEYWORDS: Annealing, Polymers, Scanning electron microscopy, Picosecond phenomena, Silicon, Semiconducting wafers, Etching, Polymerization, Solids, Directed self assembly

Proceedings Article | 26 March 2013 Paper
Proceedings Volume 8680, 868020 (2013) https://doi.org/10.1117/12.2021443
KEYWORDS: Line edge roughness, Polymers, Line width roughness, Inspection, Lithography, Neodymium, Polymerization, Edge roughness, Autoregressive models, Directed self assembly

Proceedings Article | 16 April 2012 Paper
Proceedings Volume 8323, 832310 (2012) https://doi.org/10.1117/12.918081
KEYWORDS: Polymerization, Polymers, Optical lithography, Lithography, Scanning electron microscopy, Annealing, Molecular self-assembly, Directed self assembly, Glasses, FT-IR spectroscopy

Proceedings Article | 16 April 2012 Paper
Proceedings Volume 8323, 83231T (2012) https://doi.org/10.1117/12.918077
KEYWORDS: Polymers, Computer simulations, Monte Carlo methods, Picosecond phenomena, Polymethylmethacrylate, Interfaces, Electron beam lithography, Stochastic processes, Lithography, Directed self assembly

Proceedings Article | 16 April 2012 Paper
Proceedings Volume 8323, 83232R (2012) https://doi.org/10.1117/12.918073
KEYWORDS: Polymers, Optical lithography, Lithography, Etching, Polymerization, Plasma etching, Annealing, Solids, Plasma, Directed self assembly

Proceedings Article | 20 March 2012 Paper
Proceedings Volume 8325, 83251X (2012) https://doi.org/10.1117/12.928876
KEYWORDS: Lithography, Capillaries, Photoresist processing, Scanning electron microscopy, Nitrogen, Deep ultraviolet, Thin films, Resistance, Chemistry, Semiconductors

Proceedings Article | 20 March 2012 Paper
Proceedings Volume 8325, 83251Y (2012) https://doi.org/10.1117/12.928877
KEYWORDS: Chemistry, Nitrogen, Photoresist materials, Photoresist processing, Scanning electron microscopy, Capillaries, Electron beam lithography, Liquids, Industrial chemicals, X-rays

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79722I (2011) https://doi.org/10.1117/12.894702
KEYWORDS: Polymers, Lithography, Electron beam lithography, Annealing, Optical lithography, Polymethylmethacrylate, Coating, Scanning electron microscopy, Deep ultraviolet, Directed self assembly

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721Y (2011) https://doi.org/10.1117/12.895114
KEYWORDS: Photoresist materials, Scanning electron microscopy, Capillaries, Electron beam lithography, Lithography, Semiconducting wafers, Nitrogen, Photoresist developing, Liquids, Thin films

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721W (2011) https://doi.org/10.1117/12.894705
KEYWORDS: Head-mounted displays, Silicon, Electron beam lithography, Photoresist materials, Scanning electron microscopy, Lithography, Thin films, Capillaries, Ellipsometry, Standards development

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721X (2011) https://doi.org/10.1117/12.895112
KEYWORDS: Data modeling, Polymers, Polymer thin films, Photoresist materials, Capillaries, 3D modeling, Liquids, Thin films, Nanostructures, Electron beam lithography

Proceedings Article | 2 April 2011 Paper
Proceedings Volume 7970, 79700N (2011) https://doi.org/10.1117/12.879578
KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Polymers, Lithography, Electron beam lithography, Directed self assembly, Double patterning technology, Device simulation, Computer simulations, Failure analysis

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76392F (2010) https://doi.org/10.1117/12.848419
KEYWORDS: Electron beam lithography, Deep ultraviolet, Polymers, Line edge roughness, Molecules, Solids, Optical lithography, FT-IR spectroscopy, Image resolution, Lithography

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76392G (2010) https://doi.org/10.1117/12.848415
KEYWORDS: Line edge roughness, Monte Carlo methods, 3D modeling, Diffusion, Polymers, Photoresist materials, Nanoimprint lithography, Modulation, Physics, Photoresist processing

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76391H (2010) https://doi.org/10.1117/12.862008
KEYWORDS: Head-mounted displays, Photoresist materials, Electron beam lithography, Lithography, Silicon, Thin films, Molecules, Scanning electron microscopy, Standards development, Chemistry

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76391I (2010) https://doi.org/10.1117/12.862009
KEYWORDS: Polymer thin films, Thin films, Polymers, Crystals, Quartz, Semiconducting wafers, Silicon, Optical lithography, Chemistry, Silicon films

Proceedings Article | 30 March 2010 Paper
Proceedings Volume 7639, 76392O (2010) https://doi.org/10.1117/12.848423
KEYWORDS: Photoresist materials, Lithography, Scanning electron microscopy, Photoresist processing, Chemistry, Capillaries, Liquids, Electron beam lithography, Thin films, Line edge roughness

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76390O (2010) https://doi.org/10.1117/12.848414
KEYWORDS: Molecules, Electron beam lithography, Deep ultraviolet, Line edge roughness, Polymers, Polymerization, Glasses, Dewetting, Optical lithography, Scanning electron microscopy

SPIE Journal Paper | 1 January 2010
JM3, Vol. 9, Issue 01, 013015, (January 2010) https://doi.org/10.1117/12.10.1117/1.3280258
KEYWORDS: Line edge roughness, Glasses, Diffusion, Electron beam lithography, Line width roughness, Molecules, Polymers, Photoresist materials, Silicon, Silicon films

SPIE Journal Paper | 1 January 2010
JM3, Vol. 9, Issue 01, 013016, (January 2010) https://doi.org/10.1117/12.10.1117/1.3358383
KEYWORDS: Line edge roughness, Diffusion, Monte Carlo methods, Optical spheres, Molecular aggregates, Performance modeling, Stochastic processes, Molecules, 3D modeling, Optical lithography

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 043010, (October 2009) https://doi.org/10.1117/12.10.1117/1.3259205
KEYWORDS: Deep ultraviolet, Absorbance, Polymers, Energy efficiency, Photons, Electron beams, Spectroscopic ellipsometry, Extreme ultraviolet, Refractive index, Absorption

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733C (2009) https://doi.org/10.1117/12.814426
KEYWORDS: Line edge roughness, Glasses, Diffusion, Molecules, Electron beam lithography, Line width roughness, Polymers, Silicon films, Photoresist materials, Silicon

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 727334 (2009) https://doi.org/10.1117/12.829142
KEYWORDS: Photoresist materials, Liquids, Lithography, Capillaries, Photoresist processing, Optical lithography, Head-mounted displays, Distortion, Scanning electron microscopy, Polymer thin films

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 727341 (2009) https://doi.org/10.1117/12.814447
KEYWORDS: Line edge roughness, Diffusion, Monte Carlo methods, Optical spheres, Molecular aggregates, Stochastic processes, Molecules, 3D modeling, Edge roughness, Performance modeling

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733V (2009) https://doi.org/10.1117/12.814410
KEYWORDS: Thin films, Temperature metrology, Photoresist materials, Glasses, Polymers, Polymer thin films, Interfaces, Lithography, Systems modeling, Thermal modeling

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72731R (2009) https://doi.org/10.1117/12.814459
KEYWORDS: Deep ultraviolet, Absorbance, Energy efficiency, Polymers, Photons, Electron beams, Extreme ultraviolet, Refractive index, Spectroscopic ellipsometry, Ellipsometry

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733E (2009) https://doi.org/10.1117/12.814455
KEYWORDS: Line edge roughness, Polymerization, Electron beam lithography, Glasses, Image resolution, Diffusion, Line width roughness, Molecules, Epoxies, Scanning electron microscopy

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 69232F (2008) https://doi.org/10.1117/12.782634
KEYWORDS: Polymers, Polymer thin films, Ionization, Picosecond phenomena, Deep ultraviolet, Absorption, Photoresist materials, Molecules, Matrices, Photolysis

Proceedings Article | 27 March 2008 Paper
Proceedings Volume 6923, 69230K (2008) https://doi.org/10.1117/12.773570
KEYWORDS: Molecules, Line edge roughness, Glasses, Diffusion, Image resolution, Deep ultraviolet, Polymers, Extreme ultraviolet lithography, Etching, Chemically amplified resists

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 692312 (2008) https://doi.org/10.1117/12.769004
KEYWORDS: Polymers, Absorption, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Line edge roughness, Polymer thin films, NOx, Silicon, Scanning electron microscopy

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69230Q (2008) https://doi.org/10.1117/12.774619
KEYWORDS: Line edge roughness, Diffusion, Molecules, Glasses, Critical dimension metrology, Polymers, Photoresist materials, Chemically amplified resists, Lithography, Solid modeling

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 692316 (2008) https://doi.org/10.1117/12.773393
KEYWORDS: Polymers, Polymer thin films, Polymethylmethacrylate, Absorbance, Ellipsometry, Lithography, Deep ultraviolet, Photolysis, Absorption, Chemistry

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231I (2008) https://doi.org/10.1117/12.773188
KEYWORDS: Molecules, Image resolution, Imaging systems, Line edge roughness, Electron beam lithography, Deep ultraviolet, Chemically amplified resists, Image processing, Switching, Diffusion

Proceedings Article | 12 April 2007 Paper
Michael Romeo, Kazuhiro Yamanaka, Kazuhiko Maeda, Clifford Henderson
Proceedings Volume 6519, 65191K (2007) https://doi.org/10.1117/12.713011
KEYWORDS: Polymers, Dielectrics, Chlorine, Glasses, Microelectronics, Absorption, Packaging, FT-IR spectroscopy, Water, Argon

SPIE Journal Paper | 1 April 2007
JM3, Vol. 6, Issue 02, 023012, (April 2007) https://doi.org/10.1117/12.10.1117/1.2743374
KEYWORDS: Polymers, Polymer thin films, Lithography, Optical lithography, Atomic force microscope, Metrology, Scanning probe lithography, Silicon, In situ metrology, Silicon films

Proceedings Article | 31 March 2007 Paper
Ashwini Sinha, Dennis Hess, Clifford Henderson
Proceedings Volume 6519, 65191J (2007) https://doi.org/10.1117/12.712458
KEYWORDS: Atomic layer deposition, Polymers, Etching, Polymer thin films, Plasma etching, Silicon, Plasma, Metals, Oxides, Oxygen

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6519, 65191E (2007) https://doi.org/10.1117/12.713369
KEYWORDS: Polymers, Line edge roughness, Lithography, Analog electronics, Diffusion, Image resolution, Polymer thin films, Silicon, Photoresist materials, Semiconducting wafers

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6519, 65191F (2007) https://doi.org/10.1117/12.712143
KEYWORDS: Polymers, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Photoresist materials, Electron beam lithography, Lithography, Polymerization, Image processing, Optical lithography

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6519, 65191N (2007) https://doi.org/10.1117/12.712928
KEYWORDS: Glasses, Line edge roughness, Etching, Polymers, Photoresist materials, Deep ultraviolet, Extreme ultraviolet lithography, Diffusion, Molecules, Reactive ion etching

Proceedings Article | 21 March 2007 Paper
Yueming Hua, Shubham Saxena, Jung Lee, William King, Clifford Henderson
Proceedings Volume 6517, 65171L (2007) https://doi.org/10.1117/12.713374
KEYWORDS: Polymers, Polymer thin films, Lithography, Modulation, Electron beam lithography, Atomic force microscopy, Atomic force microscope, Optical lithography, Manufacturing, Silicon

Proceedings Article | 31 March 2006 Paper
Proceedings Volume 6153, 61531G (2006) https://doi.org/10.1117/12.661803
KEYWORDS: Polymers, Lithography, Optical lithography, Nanolithography, Crystals, Thin films, Atomic force microscope, Glasses, Resistance, Atomic force microscopy

Proceedings Article | 31 March 2006 Paper
Proceedings Volume 6153, 61532E (2006) https://doi.org/10.1117/12.663410
KEYWORDS: Polymers, Data modeling, Diffusion, Photoresist materials, FT-IR spectroscopy, Statistical modeling, Molecules, Extreme ultraviolet lithography, Polymer thin films, Reflectivity

Proceedings Article | 29 March 2006 Paper
Kazuhiro Yamanaka, Michael Romeo, Kazuhiko Maeda, Clifford Henderson
Proceedings Volume 6153, 61531H (2006) https://doi.org/10.1117/12.655600
KEYWORDS: Polymers, Dielectrics, Fourier transforms, Absorption, Polymer thin films, Silicon, Crystals, Temperature metrology, Capacitors, Hydrogen

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607437
KEYWORDS: Capacitance, Polymers, Electrodes, Polymer thin films, Photoresist materials, Sensors, Molecules, Dielectrics, Chemical analysis, Data modeling

Proceedings Article | 4 May 2005 Paper
Ashwini Sinha, Dennis Hess, Clifford Henderson
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598856
KEYWORDS: Polymers, Atomic layer deposition, Polymer thin films, Polymethylmethacrylate, Titanium, Self-assembled monolayers, Silicon, Metals, Diffusion, Chemical vapor deposition

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600100
KEYWORDS: Polymers, Hydrogen, Polymer thin films, Crystals, Photoresist materials, FT-IR spectroscopy, Silicon films, Quartz, Liquid crystals, Silicon

Proceedings Article | 4 May 2005 Paper
Trevor Hoskins, Paul Roman, Peter Ludovice, Clifford Henderson
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607434
KEYWORDS: Polymers, Diffusion, Photoresist materials, Crystals, Liquids, Hydrogen, Water, Humidity, Immersion lithography, Molecules

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607435
KEYWORDS: Polymers, Polymer thin films, Chemical species, Molecules, Glasses, Thin films, Computer simulations, Diffusion, Carbon, Optical lithography

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.597308
KEYWORDS: Etching, Polymers, Plasma etching, Nanocomposites, Lithography, Plasma, Reactive ion etching, Electron beam lithography, Resistance, Silicon films

Proceedings Article | 7 March 2005 Paper
Nan Jokerst, Martin Brooke, Sang-Yeon Cho, Mikkel Thomas, Jeffrey Lillie, Daeik Kim, Stephen Ralph, Karla Dennis, Benita Comeau, Cliff Henderson
Proceedings Volume 5730, (2005) https://doi.org/10.1117/12.592771
KEYWORDS: Sensors, Silicon, Thin films, CMOS sensors, Waveguides, Thin film devices, System integration, Optoelectronic devices, Integrated optics, Etching

Proceedings Article | 20 May 2004 Paper
Celesta White, Travis Anderson, Clifford Henderson, Harry Rowland, William King
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536277
KEYWORDS: Polymers, Silicon, Microfluidics, Manufacturing, Lithography, Microelectromechanical systems, Scanning electron microscopy, Semiconducting wafers, Etching, Microsystems

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534332
KEYWORDS: Polymers, Microfluidics, Microelectromechanical systems, Optical lithography, Crystals, Fabrication, Promethium, Glasses, Semiconducting wafers, Lithography

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536218
KEYWORDS: Diffusion, Humidity, Resistance, Electrodes, Polymers, Photoresist materials, Sensors, Dielectric spectroscopy, Polymer thin films, Ions

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535333
KEYWORDS: Diffusion, Polymers, Polymer thin films, Crystals, Photoresist materials, Quartz, Molecules, Humidity, Thin films, Electron beam lithography

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536245
KEYWORDS: Electron beams, Electron beam lithography, Hydrogen, Silicon, Lithography, Silicon films, Coating, Printing, Photomasks, Molecules

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536205
KEYWORDS: Polymers, Polymer thin films, Crystals, Photoresist materials, Thin films, Quartz, Liquid crystals, Lithography, Data conversion, Diffusion

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536264
KEYWORDS: Polymers, Hydrogen, Solids, Photoresist materials, FT-IR spectroscopy, Ultraviolet radiation, Optical lithography, Lithography, Photoresist developing, Molecules

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536243
KEYWORDS: Capacitance, Data modeling, Polymers, Electrodes, Photoresist materials, Polymer thin films, Dielectrics, Sensors, Coating, Silicon

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485134
KEYWORDS: Polymer thin films, Silicon films, Polymers, Polymethylmethacrylate, Silicon, Glasses, Head-mounted displays, Oxides, Temperature metrology, Thin films

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485129
KEYWORDS: Polymethylmethacrylate, Scattering, Chemical species, Titanium, Electron beam lithography, Monte Carlo methods, Electron beams, Silicon, Molecules, Laser scattering

Proceedings Article | 12 June 2003 Paper
Trevor Hoskins, Won Jae Chung, Peter Ludovice, Clifford Henderson, Larry Seger, Larry Rhodes, Robert Shick
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485145
KEYWORDS: Polymers, Hydrogen, Polymer thin films, FT-IR spectroscopy, Solids, Lithography, Photoresist materials, Palladium, X-ray diffraction, Molecules

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485079
KEYWORDS: Polymers, Humidity, Dielectrics, Diffusion, Capacitance, Crystals, Electrodes, Photoresist materials, Thin films, Quartz

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483740
KEYWORDS: Etching, Electron beam lithography, Electron beams, Polymers, Nanocomposites, Lithography, Resistance, Silicon, Plasma etching, Plasma

Proceedings Article | 12 June 2003 Paper
Augustin Jeyakumar, Clifford Henderson, Paul Roman, Seigi Suh
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485133
KEYWORDS: Etching, Electron beam lithography, Electron beams, Plasmas, Silicon films, Titanium, Silica, Plasma etching, Silicon, Photomasks

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485137
KEYWORDS: Lithography, Sulfur, Electron beam lithography, Electron beams, Temperature metrology, Surface roughness, Interfaces, X-rays, Polymers, Photoemission spectroscopy

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485081
KEYWORDS: Capacitance, Electrodes, Polymers, Photoresist materials, Absorbance, Dielectrics, Sensors, Coating, Chemically amplified resists, Data modeling

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485006
KEYWORDS: Thin films, Data analysis, Silicon films, Photoresist materials, Interferometry, Reflectivity, Silicon, Photoresist developing, Interfaces, Oxides

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474179
KEYWORDS: Etching, Electron beams, Metals, Oxides, Plasma, Photomasks, Reactive ion etching, Lithography, Electron beam lithography, Oxygen

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474244
KEYWORDS: Electron beams, Microchannel plates, Diffractive optical elements, Polymers, Lithography, Solids, Electron beam lithography, Etching, Standards development, Mask making

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474222
KEYWORDS: Polymers, Microfluidics, Glasses, Carbonates, Fabrication, Microelectromechanical systems, Complex systems, Silicon, Integration, Dielectrics

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474191
KEYWORDS: FT-IR spectroscopy, Polymethylmethacrylate, Electron beams, Polymers, Absorbance, Ions, Crystals, Silicon films, Electron beam lithography, Quartz

Proceedings Article | 24 July 2002 Paper
Kendra McCoy, Charles Gumieny, Dennis Hess, Laren Tolbert, Clifford Henderson
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474178
KEYWORDS: Silicon, Chlorine, Polymerization, Polymers, X-rays, Deep ultraviolet, Ultraviolet radiation, Etching, Image processing, Lithography

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472317
KEYWORDS: Oxides, Dielectrics, Metals, Capacitors, Carbon, Ultraviolet radiation, Lithography, Barium, Strontium, Etching

Proceedings Article | 11 June 1999 Paper
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350173
KEYWORDS: Photomasks, Refraction, Lithography, Picture Archiving and Communication System, Data modeling, Photoresist materials, Device simulation, Chromium, Photoresist processing, Optical simulations

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312349
KEYWORDS: Refractive index, Computer simulations, Photoresist processing, Photoresist materials, Optical simulations, Performance modeling, Data modeling, Scanning electron microscopy, Diffraction, Photoresist developing

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312415
KEYWORDS: Refractive index, Data modeling, Photoresist developing, Photoresist materials, Reflectivity, Software development, Silicon, Lithography, Absorbance, Picture Archiving and Communication System

Proceedings Article | 29 June 1998 Paper
Ralph Dammel, John Sagan, Elaine Kokinda, Neville Eilbeck, Chris Mack, Graham Arthur, Clifford Henderson, Steven Scheer, Benjamen Rathsack, C. Grant Willson
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312399
KEYWORDS: Photoresist developing, Data modeling, Photoresist materials, Radon, Autoregressive models, Diffusion, Affine motion model, Standards development, Chlorine, Picture Archiving and Communication System

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312345
KEYWORDS: Polymers, Ionization, Hydrogen, Photoresist materials, Diffusion, Deep ultraviolet, Chromophores, Photoresist developing, Polarization, Ions

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312370
KEYWORDS: Etching, Lithography, Diffusion, Photoresist materials, Image processing, Semiconducting wafers, Photoresist processing, Oxygen, Absorbance, Silicon

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312416
KEYWORDS: Polymers, Polymerization, Ionization, Photoresist materials, Data modeling, Diffusion, Polymer thin films, Photoresist developing, Etching, Polymethylmethacrylate

Proceedings Article | 8 June 1998 Paper
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308747
KEYWORDS: Refractive index, Antireflective coatings, Data modeling, Photoresist materials, Spectroscopic ellipsometry, Data acquisition, Polarization, Ultraviolet radiation, Lithography, Monochromators

Proceedings Article | 7 July 1997 Paper
Allen Gardiner, Anwei Qin, Clifford Henderson, Sanju Pancholi, William Koros, C. Grant Willson, Ralph Dammel, Chris Mack, William Hinsberg
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275886
KEYWORDS: Scintillation, Diffusion, Liquids, Process control, Refraction, Data modeling, Semiconducting wafers, Picture Archiving and Communication System, Temperature metrology, Polymers

Proceedings Article | 7 July 1997 Paper
Clifford Henderson, Sanju Pancholi, Sajed Chowdhury, C. Grant Willson, Ralph Dammel
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275883
KEYWORDS: Refractive index, Photoresist materials, Transmittance, Reflection, Absorption, Lithography, Picture Archiving and Communication System, Quartz, Photoresist processing, Data modeling

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275861
KEYWORDS: Refractive index, Photoresist materials, Lithography, Absorption, Absorbance, Ultraviolet radiation, Data modeling, Semiconducting wafers, Dielectrics, Spectroscopic ellipsometry

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275810
KEYWORDS: Refractive index, Photoresist materials, Nonlinear optics, Absorption, Standards development, Photoresist processing, Phase shifts, Lithography, Imaging systems, Diffusion

Proceedings Article | 7 July 1997 Paper
Clifford Henderson, Pavlos Tsiartas, Lewis Flanagin, Sanju Pancholi, Sajed Chowdhury, Katherine Dombrowski, Ammar Chinwalla, C. Grant Willson
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275820
KEYWORDS: Photoresist developing, Semiconducting wafers, Photoresist materials, Lithography, Picture Archiving and Communication System, Refractive index, Absorption, Photoresist processing, Statistical analysis, Data modeling

Proceedings Article | 7 July 1997 Paper
Clifford Henderson, Pavlos Tsiartas, Sanju Pancholi, Sajed Chowdhury, Katherine Dombrowski, C. Grant Willson, Ralph Dammel
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275882
KEYWORDS: Photoresist developing, Data modeling, Picture Archiving and Communication System, Diffusion, Refractive index, Photoresist materials, Lithography, Information operations, Semiconducting wafers, Silicon

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276032
KEYWORDS: Photoresist materials, Refractive index, Nonlinear optics, Beam propagation method, Lithography

Proceedings Article | 14 June 1996 Paper
Clifford Henderson, Pavlos Tsiartas, Logan Simpson, Kelly Clayton, Sanju Pancholi, Adam Pawlowski, C. Grant Willson
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241846
KEYWORDS: Ions, Polymers, Alkali metals, Potassium, Macromolecules, Interfaces, Polymer thin films, Molecules, Photoresist developing, Photoresist materials

Showing 5 of 119 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 30 March 2009

SPIE Conference Volume | 24 April 2008

SPIE Conference Volume | 15 March 2007

SPIE Conference Volume | 9 March 2006

Conference Committee Involvement (22)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXI
24 February 2014 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXX
25 February 2013 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIX
13 February 2012 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVIII
28 February 2011 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVII
22 February 2010 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIII
20 February 2006 | San Jose, California, United States
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
Showing 5 of 22 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top